Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12072627 | Resist composition and patterning process | Shinya Yamashita, Masaki Ohashi, Tomohiro Kobayashi, Kenichi Oikawa, Takayuki Fujiwara | 2024-08-27 |
| 12050402 | Resist composition and patterning process | Tomohiro Kobayashi, Kenichi Oikawa, Masaki Ohashi, Takayuki Fujiwara | 2024-07-30 |
| 11693314 | Resist composition and patterning process | Shinya Yamashita, Masaki Ohashi, Tomohiro Kobayashi, Kenichi Oikawa, Takayuki Fujiwara | 2023-07-04 |
| 11662663 | Substrate protective film-forming composition and pattern forming process | Tomohiro Kobayashi, Kenichi Oikawa, Masayoshi Sagehashi | 2023-05-30 |
| 11340527 | Resist composition and patterning process | Shinya Yamashita, Masaki Ohashi, Takayuki Fujiwara | 2022-05-24 |
| 11262653 | Sulfonium salt, polymer, resist composition, and patterning process | Masaki Ohashi, Jun Hatakeyama | 2022-03-01 |
| 11009793 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama | 2021-05-18 |
| 10921710 | Resist composition and pattern forming process | Ryosuke Taniguchi, Kazuhiro Katayama | 2021-02-16 |
| 10457761 | Polymer, resist composition, and pattern forming process | Jun Hatakeyama, Kenji Funatsu | 2019-10-29 |
| 10310376 | Resist composition, pattern forming process, polymer, and monomer | Ryosuke Taniguchi, Koji Hasegawa, Kenji Yamada | 2019-06-04 |
| 10191373 | Method for producing polymer | Jun Hatakeyama, Kenji Funatsu | 2019-01-29 |
| 10023674 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Masahiro Fukushima, Koji Hasegawa, Kazuhiro Katayama, Jun Hatakeyama | 2018-07-17 |
| 10012902 | Positive resist composition and pattern forming process | Jun Hatakeyama, Masaki Ohashi | 2018-07-03 |
| 9904169 | Photomask blank, resist pattern forming process, and method for making photomask | Satoshi Watanabe, Daisuke Domon, Keiichi Masunaga | 2018-02-27 |
| 9846360 | Resist composition and patterning process | Jun Hatakeyama | 2017-12-19 |
| 9829792 | Monomer, polymer, positive resist composition, and patterning process | Koji Hasegawa, Jun Hatakeyama | 2017-11-28 |
| 9760010 | Patterning process | Jun Hatakeyama | 2017-09-12 |
| 9429846 | Pattern forming process and shrink agent | Jun Hatakeyama, Masayoshi Sagehashi | 2016-08-30 |
| 9360760 | Pattern forming process and shrink agent | Jun Hatakeyama | 2016-06-07 |
| 9146464 | Sulfonium salt, polymer, polymer making method, resist composition, and patterning process | Masaki Ohashi, Jun Hatakeyama, Masahiro Fukushima | 2015-09-29 |
| 9091918 | Sulfonium salt, polymer, resist composition, and patterning process | Masahiro Fukushima, Jun Hatakeyama, Masaki Ohashi | 2015-07-28 |
| 9017931 | Patterning process and resist composition | Koji Hasegawa, Jun Hatakeyama, Masayoshi Sagehashi | 2015-04-28 |