Issued Patents All Time
Showing 1–25 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11548844 | Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process | Masayoshi Sagehashi, Masaaki Kotake, Naoya Inoue, Keiichi Masunaga, Satoshi Watanabe | 2023-01-10 |
| 11500285 | Multifunctional polymers | Luisa D. Bozano, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders +3 more | 2022-11-15 |
| 11429023 | Onium salt, negative resist composition, and resist pattern forming process | Naoya Inoue, Masaki Ohashi, Keiichi Masunaga, Masaaki Kotake | 2022-08-30 |
| 11131926 | Resist composition and resist patterning process | Takahiro Suzuki, Masaaki Kotake, Keiichi Masunaga, Satoshi Watanabe | 2021-09-28 |
| 11124477 | Sulfonium compound, positive resist composition, and resist pattern forming process | Naoya Inoue, Masaki Ohashi, Keiichi Masunaga, Masaaki Kotake | 2021-09-21 |
| 11048165 | Resist composition and patterning process | Jun Hatakeyama | 2021-06-29 |
| 11036136 | Onium salt, chemically amplified positive resist composition, and resist pattern forming process | Naoya Inoue, Satoshi Watanabe | 2021-06-15 |
| 10968175 | Resist composition and patterning process | Jun Hatakeyama | 2021-04-06 |
| 10377842 | Polymer, negative resist composition, and pattern forming process | Jun Hatakeyama | 2019-08-13 |
| 10345700 | Negative-tone resist compositions and multifunctional polymers therein | Luisa D. Bozano, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders +3 more | 2019-07-09 |
| 10191372 | Polymer, positive resist composition, and pattern forming process | Jun Hatakeyama | 2019-01-29 |
| 9969829 | Polymer compound, negative resist composition, laminate, patterning process, and compound | Koji Hasegawa, Keiichi Masunaga, Masaaki Kotake | 2018-05-15 |
| 9944738 | Polymer compound, positive resist composition, laminate, and resist patterning process | Satoshi Watanabe, Keiichi Masunaga, Masaaki Kotake | 2018-04-17 |
| RE46765 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe | 2018-03-27 |
| RE46736 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe | 2018-02-27 |
| 9904172 | Shrink material and pattern forming process | Kentaro Kumaki, Satoshi Watanabe, Koji Hasegawa, Kenji Yamada | 2018-02-27 |
| 9904169 | Photomask blank, resist pattern forming process, and method for making photomask | Teppei Adachi, Satoshi Watanabe, Keiichi Masunaga | 2018-02-27 |
| 9740098 | Chemically amplified negative resist composition using novel onium salt and resist pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Masaaki Kotake, Takayuki Fujiwara | 2017-08-22 |
| 9720323 | Chemically amplified positive resist composition and pattern forming process | Masaaki Kotake, Takayuki Fujiwara, Keiichi Masunaga, Satoshi Watanabe | 2017-08-01 |
| 9709890 | Resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi, Koji Hasegawa | 2017-07-18 |
| 9645493 | Negative resist composition and pattern forming process | Keiichi Masunaga, Satoshi Watanabe | 2017-05-09 |
| 9632417 | Shrink material and pattern forming process | Kentaro Kumaki, Satoshi Watanabe, Jun Hatakeyama | 2017-04-25 |
| 9604921 | Sulfonium salt, resist composition and resist pattern forming process | Satoshi Watanabe, Keiichi Masunaga, Masahiro Fukushima | 2017-03-28 |
| 9535325 | Onium salt, chemically amplified positive resist composition, and patterning process | Keiichi Masunaga, Satoshi Watanabe, Masahiro Fukushima, Koji Hasegawa | 2017-01-03 |
| 9500949 | Chemically-amplified positive resist composition and resist patterning process using the same | Keiichi Masunaga, Satoshi Watanabe, Masaki Ohashi, Masahiro Fukushima | 2016-11-22 |