Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9436083 | Chemically-amplified negative resist composition and resist patterning process using the same | Keiichi Masunaga, Satoshi Watanabe | 2016-09-06 |
| 9348227 | Chemically amplified resist composition and pattern forming process | Masahiro Fukushima, Keiichi Masunaga, Satoshi Watanabe | 2016-05-24 |
| 9329476 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe, Masaki Ohashi | 2016-05-03 |
| 9285678 | Sulfonium salt, resist composition and resist pattern forming process | Keiichi Masunaga, Masayoshi Sagehashi, Satoshi Watanabe | 2016-03-15 |
| 9182670 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe | 2015-11-10 |
| 9023587 | Negative resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2015-05-05 |
| 8968979 | Positive resist composition and patterning process | Katsuya Takemura, Keiichi Masunaga, Masayoshi Sagehashi | 2015-03-03 |
| 8951710 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe | 2015-02-10 |
| 8859181 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe, Jun Hatakeyama, Youichi Ohsawa | 2014-10-14 |
| 8835096 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe | 2014-09-16 |
| 8835097 | Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process | Keiichi Masunaga, Satoshi Watanabe | 2014-09-16 |
| 8828645 | Negative resist composition and patterning process | Akinobu Tanaka, Keiichi Masunaga, Satoshi Watanabe | 2014-09-09 |
| 8815491 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe | 2014-08-26 |
| 8685629 | Resist pattern forming process | Keiichi Masunaga, Takeru Watanabe, Satoshi Watanabe | 2014-04-01 |
| 8632939 | Polymer, chemically amplified positive resist composition and pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Jun Hatakeyama, Youichi Ohsawa | 2014-01-21 |
| 8603724 | Negative resist composition and patterning process | Akinobu Tanaka, Keiichi Masunaga, Satoshi Watanabe | 2013-12-10 |
| 8597868 | Negative resist composition and patterning process | Keiichi Masunaga, Akinobu Tanaka, Satoshi Watanabe | 2013-12-03 |
| 8557509 | Negative resist composition, patterning process, and testing process and preparation process of negative resist composition | Akinobu Tanaka, Keiichi Masunaga, Satoshi Watanabe | 2013-10-15 |
| 8546060 | Chemically amplified positive resist composition and pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Akinobu Tanaka | 2013-10-01 |
| 8501942 | Polymerizable monomers | Satoshi Watanabe | 2013-08-06 |
| 8470511 | Chemically amplified negative resist composition for EB or EUV lithography and patterning process | Keiichi Masunaga, Satoshi Watanabe, Akinobu Tanaka | 2013-06-25 |
| 8470509 | Negative resist composition and patterning process | Akinobu Tanaka, Keiichi Masunaga, Satoshi Watanabe | 2013-06-25 |
| 8426108 | Chemically amplified positive resist composition for EB or EUV lithography and patterning process | Keiichi Masunaga, Satoshi Watanabe, Akinobu Tanaka | 2013-04-23 |
| 8389201 | Positive resist composition and pattern forming process | Akinobu Tanaka, Keiichi Masunaga, Satoshi Watanabe | 2013-03-05 |
| 8361692 | Negative resist composition and patterning process using the same | Akinobu Tanaka, Keiichi Masunaga, Satoshi Watanabe | 2013-01-29 |