Issued Patents All Time
Showing 1–25 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429772 | Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound | Kenji Funatsu, Masaaki Kotake, Naoya Inoue | 2025-09-30 |
| 12164231 | Chemically amplified positive resist composition and resist pattern forming process | Masaaki Kotake, Satoshi Watanabe, Masaki Ohashi | 2024-12-10 |
| 12164227 | Chemically amplified negative resist composition and resist pattern forming process | Satoshi Watanabe, Masaaki Kotake, Masaki Ohashi | 2024-12-10 |
| 11852974 | Conductive polymer composition, coated product and patterning process | Takayuki Nagasawa, Masaaki Kotake, Satoshi Watanabe | 2023-12-26 |
| 11548844 | Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process | Daisuke Domon, Masayoshi Sagehashi, Masaaki Kotake, Naoya Inoue, Satoshi Watanabe | 2023-01-10 |
| 11500285 | Multifunctional polymers | Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Martha I. Sanchez, Daniel P. Sanders +3 more | 2022-11-15 |
| 11429023 | Onium salt, negative resist composition, and resist pattern forming process | Daisuke Domon, Naoya Inoue, Masaki Ohashi, Masaaki Kotake | 2022-08-30 |
| 11231650 | Chemically amplified negative resist composition and resist pattern forming process | Masaaki Kotake, Satoshi Watanabe | 2022-01-25 |
| 11131926 | Resist composition and resist patterning process | Takahiro Suzuki, Daisuke Domon, Masaaki Kotake, Satoshi Watanabe | 2021-09-28 |
| 11124477 | Sulfonium compound, positive resist composition, and resist pattern forming process | Naoya Inoue, Masaki Ohashi, Daisuke Domon, Masaaki Kotake | 2021-09-21 |
| 10725377 | Chemically amplified negative resist composition and resist pattern forming process | Masaaki Kotake, Satoshi Watanabe, Kenji Yamada, Masaki Ohashi | 2020-07-28 |
| 10585345 | Photomask blank, method for manufacturing photomask, and mask pattern formation method | Shigeo Irie, Takashi Yoshii, Yukio Inazuki, Hideo Kaneko, Toyohisa Sakurada | 2020-03-10 |
| 10495969 | Chemically amplified positive resist composition and resist pattern forming process | Masaaki Kotake, Satoshi Watanabe, Masaki Ohashi | 2019-12-03 |
| 10416558 | Positive resist composition, resist pattern forming process, and photomask blank | Satoshi Watanabe, Masaaki Kotake, Masaki Ohashi | 2019-09-17 |
| 10345700 | Negative-tone resist compositions and multifunctional polymers therein | Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Martha I. Sanchez, Daniel P. Sanders +3 more | 2019-07-09 |
| 10120279 | Negative resist composition and resist pattern forming process | Satoshi Watanabe, Masaaki Kotake, Kenji Yamada, Masaki Ohashi | 2018-11-06 |
| 9969829 | Polymer compound, negative resist composition, laminate, patterning process, and compound | Daisuke Domon, Koji Hasegawa, Masaaki Kotake | 2018-05-15 |
| 9944738 | Polymer compound, positive resist composition, laminate, and resist patterning process | Daisuke Domon, Satoshi Watanabe, Masaaki Kotake | 2018-04-17 |
| RE46765 | Chemically amplified negative resist composition and patterning process | Daisuke Domon, Satoshi Watanabe | 2018-03-27 |
| RE46736 | Chemically amplified negative resist composition and patterning process | Daisuke Domon, Satoshi Watanabe | 2018-02-27 |
| 9904169 | Photomask blank, resist pattern forming process, and method for making photomask | Teppei Adachi, Satoshi Watanabe, Daisuke Domon | 2018-02-27 |
| 9740098 | Chemically amplified negative resist composition using novel onium salt and resist pattern forming process | Satoshi Watanabe, Masaaki Kotake, Daisuke Domon, Takayuki Fujiwara | 2017-08-22 |
| 9720323 | Chemically amplified positive resist composition and pattern forming process | Masaaki Kotake, Takayuki Fujiwara, Daisuke Domon, Satoshi Watanabe | 2017-08-01 |
| 9645493 | Negative resist composition and pattern forming process | Daisuke Domon, Satoshi Watanabe | 2017-05-09 |
| 9604921 | Sulfonium salt, resist composition and resist pattern forming process | Daisuke Domon, Satoshi Watanabe, Masahiro Fukushima | 2017-03-28 |