Issued Patents All Time
Showing 51–62 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8470511 | Chemically amplified negative resist composition for EB or EUV lithography and patterning process | Satoshi Watanabe, Akinobu Tanaka, Daisuke Domon | 2013-06-25 |
| 8470512 | Polymer, chemically amplified negative resist composition, and patterning process | Satoshi Watanabe, Akinobu Tanaka | 2013-06-25 |
| 8426108 | Chemically amplified positive resist composition for EB or EUV lithography and patterning process | Satoshi Watanabe, Akinobu Tanaka, Daisuke Domon | 2013-04-23 |
| 8389201 | Positive resist composition and pattern forming process | Akinobu Tanaka, Daisuke Domon, Satoshi Watanabe | 2013-03-05 |
| 8367295 | Preparation process of chemically amplified resist composition | Takanobu Takeda, Tamotsu Watanabe, Satoshi Watanabe, Ryuji Koitabashi, Osamu Watanabe | 2013-02-05 |
| 8361693 | Chemically amplified positive photoresist composition and pattern forming process | Akinobu Tanaka, Daisuke Domon, Satoshi Watanabe, Youichi Ohsawa, Masaki Ohashi | 2013-01-29 |
| 8361692 | Negative resist composition and patterning process using the same | Akinobu Tanaka, Daisuke Domon, Satoshi Watanabe | 2013-01-29 |
| 8343694 | Photomask blank, resist pattern forming process, and photomask preparation process | Ryuji Koitabashi, Satoshi Watanabe, Takanobu Takeda, Tamotsu Watanabe | 2013-01-01 |
| 8288076 | Chemically amplified resist composition and pattern forming process | Satoshi Watanabe, Akinobu Tanaka, Daisuke Domon | 2012-10-16 |
| 8273830 | Deprotection method of protected polymer | Takeru Watanabe, Daisuke Domon, Satoshi Watanabe | 2012-09-25 |
| 8110335 | Resist patterning process and manufacturing photo mask | Takanobu Takeda, Satoshi Watanabe, Tamotsu Watanabe, Akinobu Tanaka, Ryuji Koitabashi | 2012-02-07 |
| 7501223 | Polymer, resist composition and patterning process using the same | Takanobu Takeda, Osamu Watanabe, Satoshi Watanabe, Ryuji Koitabashi, Tamotsu Watanabe | 2009-03-10 |