Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10768524 | Photomask blank substrate container, method for storing photomask blank substrate and method for transporting photomask blank substrate | Shogo Ito | 2020-09-08 |
| 9091931 | Photomask blank and method for manufacturing photomask | Yosuke Kojima, Hiroki Yoshikawa, Yukio Inazuki | 2015-07-28 |
| 9075306 | Chemically amplified negative resist composition and patterning process | Takanobu Takeda, Tamotsu Watanabe, Keiichi Masunaga, Akinobu Tanaka, Osamu Watanabe | 2015-07-07 |
| 8858814 | Photomask blank, processing method, and etching method | Satoshi Watanabe, Hideo Kaneko, Shinichi Igarashi, Yoshio Kawai, Shozo Shirai | 2014-10-14 |
| 8753786 | Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank | Hiroki Yoshikawa, Yukio Inazuki, Hideo Kaneko, Yosuke Kojima, Takashi Haraguchi +1 more | 2014-06-17 |
| 8753787 | Light pattern exposure method, photomask, and photomask blank | Hiroki Yoshikawa, Yukio Inazuki, Hideo Kaneko, Yosuke Kojima, Takashi Haraguchi +1 more | 2014-06-17 |
| 8475978 | Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film | Hiroki Yoshikawa, Yukio Inazuki, Hideo Kaneko, Takashi Haraguchi, Yosuke Kojima +1 more | 2013-07-02 |
| 8367295 | Preparation process of chemically amplified resist composition | Keiichi Masunaga, Takanobu Takeda, Tamotsu Watanabe, Satoshi Watanabe, Osamu Watanabe | 2013-02-05 |
| 8343694 | Photomask blank, resist pattern forming process, and photomask preparation process | Satoshi Watanabe, Takanobu Takeda, Keiichi Masunaga, Tamotsu Watanabe | 2013-01-01 |
| 8110335 | Resist patterning process and manufacturing photo mask | Takanobu Takeda, Satoshi Watanabe, Tamotsu Watanabe, Akinobu Tanaka, Keiichi Masunaga | 2012-02-07 |
| 7977027 | Resist composition and patterning process | Takanobu Takeda, Osamu Watanabe, Satoshi Watanabe, Youichi Ohsawa, Tamotsu Watanabe | 2011-07-12 |
| 7501223 | Polymer, resist composition and patterning process using the same | Takanobu Takeda, Osamu Watanabe, Satoshi Watanabe, Keiichi Masunaga, Tamotsu Watanabe | 2009-03-10 |
| 7312016 | Chemically amplified positive resist composition and patterning process | Satoshi Watanabe, Youichi Ohsawa | 2007-12-25 |
| 7288363 | Chemically amplified positive resist composition and patterning process | Satoshi Watanabe, Youichi Ohsawa | 2007-10-30 |
| 6861198 | Negative resist material and pattern formation method using the same | Takanobu Takeda, Osamu Watanabe, Wataru Kusaki | 2005-03-01 |