Issued Patents All Time
Showing 1–25 of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12265321 | Reflective mask blank, and method for manufacturing reflective mask | Takuro Kosaka, Taiga OGOSE, Yukio Inazuki | 2025-04-01 |
| 12181790 | Reflective mask blank and reflective mask | Shohei Mimura, Tsuneo Terasawa | 2024-12-31 |
| 11860529 | Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank | Yukio Inazuki, Tsuneo Terasawa, Takuro Kosaka, Kazuhiro Nishikawa | 2024-01-02 |
| 11835851 | Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank | Yukio Inazuki, Tsuneo Terasawa, Takuro Kosaka, Kazuhiro Nishikawa | 2023-12-05 |
| 11774845 | Photomask blank, and manufacturing method thereof | Kouhei Sasamoto | 2023-10-03 |
| 11624712 | Substrate defect inspection method and substrate defect inspection apparatus | Tsuneo Terasawa, Yukio Inazuki | 2023-04-11 |
| 11415874 | Method of manufacturing reflective mask blank, reflective mask blank, and method of manufacturing reflective mask | Tsuneo Terasawa, Yukio Inazuki, Takuro Kosaka | 2022-08-16 |
| 11327393 | Photomask blank and method for preparing photomask | Takuro Kosaka, Yukio Inazuki | 2022-05-10 |
| 11073756 | Photomask blank, photomask blank making method, and photomask making method | Takuro Kosaka, Shigeo Irie, Naoki Kawaura | 2021-07-27 |
| 10989999 | Halftone phase shift mask blank and halftone phase shift mask | Yukio Inazuki, Takuro Kosaka, Kouhei Sasamoto | 2021-04-27 |
| 10859904 | Halftone phase shift photomask blank, making method, and halftone phase shift photomask | Takuro Kosaka, Yukio Inazuki | 2020-12-08 |
| 10678125 | Photomask blank and method for preparing photomask | Takuro Kosaka, Yukio Inazuki | 2020-06-09 |
| 10670957 | Halftone phase shift photomask blank, making method, and halftone phase shift photomask | Takuro Kosaka, Yukio Inazuki | 2020-06-02 |
| 10585345 | Photomask blank, method for manufacturing photomask, and mask pattern formation method | Shigeo Irie, Takashi Yoshii, Keiichi Masunaga, Yukio Inazuki, Toyohisa Sakurada | 2020-03-10 |
| 10488750 | Mask blank and making method | Yukio Inazuki | 2019-11-26 |
| 10466583 | Halftone phase shift mask blank and halftone phase shift mask | Yukio Inazuki, Takuro Kosaka, Kouhei Sasamoto | 2019-11-05 |
| 10459333 | Halftone phase shift photomask blank and making method | Takuro Kosaka, Yukio Inazuki | 2019-10-29 |
| 10372030 | Halftone phase shift mask blank and halftone phase shift mask | Kouhei Sasamoto, Takuro Kosaka, Yukio Inazuki | 2019-08-06 |
| 10146122 | Halftone phase shift photomask blank and making method | Takuro Kosaka, Yukio Inazuki | 2018-12-04 |
| 9812300 | Silicon target for sputtering film formation and method for forming silicon-containing thin film | Hiroki Yoshikawa, Yukio Inazuki | 2017-11-07 |
| 9798229 | Designing of photomask blank and photomask blank | Kouhei Sasamoto, Yukio Inazuki, Souichi Fukaya | 2017-10-24 |
| 9709885 | Photomask blank and method for manufacturing photomask blank | Yukio Inazuki, Takashi Yoshii, Toyohisa Sakurada, Akira Ikeda, Satoshi Watanabe +1 more | 2017-07-18 |
| 9645485 | Halftone phase shift photomask blank and making method | Takuro Kosaka, Yukio Inazuki, Toyohisa Sakurada | 2017-05-09 |
| 9541823 | Photomask blank | Kouhei Sasamoto, Yukio Inazuki, Souichi Fukaya, Hideo Nakagawa | 2017-01-10 |
| 9488906 | Photomask blank and method for manufacturing photomask blank | Yukio Inazuki, Takashi Yoshii, Toyohisa Sakurada, Akira Ikeda, Satoshi Watanabe +1 more | 2016-11-08 |