Issued Patents All Time
Showing 1–25 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12181790 | Reflective mask blank and reflective mask | Shohei Mimura, Hideo Kaneko | 2024-12-31 |
| 11940391 | Defect inspection apparatus, method for inspecting defect, and method for manufacturing photomask blank | Ryusei Terashima, Takumi Yoshino | 2024-03-26 |
| 11860529 | Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank | Yukio Inazuki, Takuro Kosaka, Hideo Kaneko, Kazuhiro Nishikawa | 2024-01-02 |
| 11835851 | Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank | Yukio Inazuki, Takuro Kosaka, Hideo Kaneko, Kazuhiro Nishikawa | 2023-12-05 |
| 11789357 | Method of manufacturing reflective mask blank, and reflective mask blank | Yukio Inazuki, Takuro Kosaka | 2023-10-17 |
| 11624712 | Substrate defect inspection method and substrate defect inspection apparatus | Yukio Inazuki, Hideo Kaneko | 2023-04-11 |
| 11415874 | Method of manufacturing reflective mask blank, reflective mask blank, and method of manufacturing reflective mask | Hideo Kaneko, Yukio Inazuki, Takuro Kosaka | 2022-08-16 |
| 11061319 | Photomask blank and making method | Takuro Kosaka, Shigeo Irie, Takahiro KISHITA | 2021-07-13 |
| 10488347 | Defect classification method, method of sorting photomask blanks, and method of manufacturing mask blank | Hiroshi Fukuda, Daisuke Iwai | 2019-11-26 |
| 10295477 | Methods for defect inspection, sorting, and manufacturing photomask blank | Hiroshi Fukuda, Atsushi YOKOHATA, Takahiro KISHITA, Daisuke Iwai | 2019-05-21 |
| 9958399 | Imaging apparatus and imaging method | Takeshi Yamane | 2018-05-01 |
| 9829442 | Defect inspecting method, sorting method and producing method for photomask blank | Atsushi YOKOHATA, Daisuke Iwai, Takahiro KISHITA, Hiroshi Fukuda | 2017-11-28 |
| 9829787 | Defect inspecting method, sorting method, and producing method for photomask blank | Hiroshi Fukuda, Takahiro KISHITA, Daisuke Iwai, Atsushi YOKOHATA | 2017-11-28 |
| 9772551 | Evaluation method of defect size of photomask blank, selection method, and manufacturing method | Takahiro KISHITA, Daisuke Iwai, Hiroshi Fukuda, Atsushi YOKOHATA | 2017-09-26 |
| 9229314 | Method of inspecting mask, mask inspection device, and method of manufacturing mask | Osamu Suga | 2016-01-05 |
| 9063098 | Method of inspecting mask, mask inspection device, and method of manufacturing mask | Osamu Suga | 2015-06-23 |
| 8986913 | Method and apparatus for inspecting a mask substrate for defects, method of manufacturing a photomask, and method of manufacturing a semiconductor device | Takeshi Yamane | 2015-03-24 |
| 8912501 | Optimum imaging position detecting method, optimum imaging position detecting device, photomask manufacturing method, and semiconductor device manufacturing method | Takeshi Yamane | 2014-12-16 |
| 8797524 | Mask inspection method and mask inspection apparatus | Takeshi Yamane | 2014-08-05 |
| 8699783 | Mask defect inspection method and defect inspection apparatus | Takeshi Yamane | 2014-04-15 |
| 8488866 | Method of inspecting mask pattern and mask pattern inspection apparatus | Toshihiko Tanaka, Hiroyuki Shigemura, Hajime Aoyama, Osamu Suga | 2013-07-16 |
| 8435702 | Manufacturing method of semiconductor device and manufacturing method of mask | Takeshi Yamane | 2013-05-07 |
| 8384888 | Mask defect measurement method, mask quality determination and method, and manufacturing method of semiconductor device | Takeshi Yamane, Toshihiko Tanaka | 2013-02-26 |
| 7911600 | Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuits | Toshihiko Tanaka, Tatsuya Aota | 2011-03-22 |
| 7630068 | Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same | Toshihiko Tanaka, Yoshihiro Tezuka | 2009-12-08 |