Issued Patents All Time
Showing 26–50 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7369703 | Method and apparatus for circuit pattern inspection | Atsuko Yamaguchi, Tadashi Otaka, Takashi Iizumi, Osamu Komuro | 2008-05-06 |
| 7361530 | Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light | Toshihiko Tanaka, Ko Miyazaki, Norio Hasegawa, Kazutaka Mori | 2008-04-22 |
| 7205222 | Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light | Toshihiko Tanaka, Ko Miyazaki, Norio Hasegawa, Kazutaka Mori | 2007-04-17 |
| 7125651 | Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks | Norio Hasegawa, Toshihiko Tanaka | 2006-10-24 |
| 7095884 | Method and apparatus for circuit pattern inspection | Atsuko Yamaguchi, Tadashi Otaka, Takashi Iizumi, Osamu Komuro | 2006-08-22 |
| 6849540 | METHOD OF FABRICATING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND METHOD OF PRODUCING A MULTI-CHIP MODULE THAT INCLUDES PATTERNING WITH A PHOTOMASK THAT USES METAL FOR BLOCKING EXPOSURE LIGHT AND A PHOTOMASK THAT USES ORGANIC RESIN FOR BLOCKING EXPOSURE LIGHT | Toshihiko Tanaka, Ko Miyazaki, Norio Hasegawa, Kazutaka Mori | 2005-02-01 |
| 6709880 | Semiconductor device and a manufacturing method of the same | Jiro Yamamoto, Fumio Murai, Tosiyuki Yamamoto | 2004-03-23 |
| 6686099 | Method of manufacturing a photomask | Toshihiko Tanaka, Norio Hasegawa | 2004-02-03 |
| 6677107 | Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor | Norio Hasegawa, Toshihiko Tanaka | 2004-01-13 |
| 6667135 | Method of manufacturing a photomask | Toshihiko Tanaka, Norio Hasegawa | 2003-12-23 |
| 6656645 | Method of manufacturing a photomask | Toshihiko Tanaka, Norio Hasegawa | 2003-12-02 |
| 6645856 | Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate | Toshihiko Tanaka, Norio Hasegawa | 2003-11-11 |
| 6596656 | Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM | Toshihiko Tanaka, Norio Hasegawa, Kazutaka Mori, Ko Miyazaki | 2003-07-22 |
| 6329112 | Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens | Hiroshi Fukuda, Seiichiro Shirai, Katsuya Hayano, Norio Hasegawa | 2001-12-11 |
| 6020109 | Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices | Yoshihiko Okamoto, Akira Imai, Norio Hasegawa, Shinji Okazaki | 2000-02-01 |
| 5932395 | Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices | Yoshihiko Okamoto, Akira Imai, Norio Hasegawa, Shinji Okazaki | 1999-08-03 |
| 5902705 | Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices | Yoshihiko Okamoto, Akira Imai, Norio Hasegawa, Shinji Okazaki | 1999-05-11 |
| 5895741 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Norio Hasegawa, Hiroshi Fukuda, Katsuya Hayano, Akira Imai, Akemi Moniwa +1 more | 1999-04-20 |
| 5700601 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Norio Hasegawa, Hiroshi Fukuda, Katsuya Hayano, Akira Imai, Akemi Moniwa +1 more | 1997-12-23 |
| 5691115 | Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices | Yoshihiko Okamoto, Akira Imai, Norio Hasegawa, Shinji Okazaki | 1997-11-25 |
| 5621497 | Pattern forming method and projection exposure tool therefor | Shinji Okazaki, Minoru Toriumi | 1997-04-15 |
| 5595857 | Method of forming a pattern and projection exposure apparatus | Hiroshi Fukuda | 1997-01-21 |
| 5420436 | Methods for measuring optical system, and method and apparatus for exposure using said measuring method | Eiichi Seya, Massaaki Ito, Soichi Katagiri, Minoru Hidaka, Eiji Takeda +1 more | 1995-05-30 |
| 5418598 | Projection exposure apparatus | Hiroshi Fukuda | 1995-05-23 |
| 5408320 | Workpiece having alignment marks for positioning a pattern at a different pitch to be formed thereon, and method for fabricating the same | Soichi Katagiri, Shigeo Moriyama, Masaaki Itou | 1995-04-18 |