Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8835083 | Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device | Ayumi Minamide, Akira Imai | 2014-09-16 |
| 8563200 | Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device | Ayumi Minamide, Akira Imai | 2013-10-22 |
| 8426087 | Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method | Ayumi Minamide, Mitsuru Okuno, Manabu Ishibashi | 2013-04-23 |
| 8367309 | Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask | Mitsuru Okuno | 2013-02-05 |
| 8119308 | Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask | Ayumi Minamide, Junjiro Sakai, Manabu Ishibashi | 2012-02-21 |
| 8071264 | Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask | Mitsuru Okuno | 2011-12-06 |
| 7935462 | Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask | Mitsuru Okuno | 2011-05-03 |
| 7682760 | Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask | Mitsuru Okuno | 2010-03-23 |
| 6964832 | Semiconductor device and manufacturing method thereof | Jiro Yamamoto, Fumio Murai, Hiroshi Fukuda | 2005-11-15 |
| 6787459 | Method for fabricating a semiconductor device | Takuya Hagiwara, Keitaro Katabuchi, Hiroshi Fukuda, Mineko Adachi | 2004-09-07 |
| 6586341 | Method of manufacturing semiconductor device | Hiroshi Fukuda, Fumio Murai | 2003-07-01 |
| 5895741 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Norio Hasegawa, Tsuneo Terasawa, Hiroshi Fukuda, Katsuya Hayano, Akira Imai +1 more | 1999-04-20 |
| 5700601 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Norio Hasegawa, Tsuneo Terasawa, Hiroshi Fukuda, Katsuya Hayano, Akira Imai +1 more | 1997-12-23 |