Issued Patents All Time
Showing 1–25 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11391630 | Spectrum measuring device and spectrum measuring method | — | 2022-07-19 |
| 10870828 | Cell survival rate determining device | — | 2020-12-22 |
| 10627337 | Cell survival rate determining device and cell survival rate determining method | — | 2020-04-21 |
| 10554131 | Power supply unit having a transformer with a primary winding and a secondary winding for supplying a voltage | Takayuki Yoshida, Hajime Misumi, Tsutomu Taji, Hyeonju Kim, Takashi Fujii +1 more | 2020-02-04 |
| 10545018 | Pattern measurement device, and computer program for measuring pattern | Satoru Yamaguchi, Akiyuki Sugiyama, Miki Isawa, Akihiro Onizawa, Ryuji Mitsuhashi | 2020-01-28 |
| 10445875 | Pattern-measuring apparatus and semiconductor-measuring system | Yasutaka Toyoda, Takeshi Kato, Hitoshi Sugahara, Yutaka Hojo, Daisuke Hibino +1 more | 2019-10-15 |
| 10302548 | Fluorescent particle measuring method | — | 2019-05-28 |
| 9990708 | Pattern-measuring apparatus and semiconductor-measuring system | Yasutaka Toyoda, Takeshi Kato, Hitoshi Sugahara, Yutaka Hojo, Daisuke Hibino +1 more | 2018-06-05 |
| 9589343 | Pattern measurement device, evaluation method of polymer compounds used in self-assembly lithography, and computer program | Miki Isawa, Kei Sakai | 2017-03-07 |
| 9390934 | Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device | Kazuyuki Kakuta, Toshihiko Onozuka, Shigeru Matsui, Yoshisada Ebata | 2016-07-12 |
| 9297649 | Pattern dimension measurement method and charged particle beam apparatus | Hiroki Kawada, Toru Ikegami | 2016-03-29 |
| 9183622 | Image processing apparatus | Yasutaka Toyoda, Ryoichi Matsuoka, Atsuko Yamaguchi | 2015-11-10 |
| 9024272 | Pattern measuring apparatus | Kei Sakai, Yafeng Zhang | 2015-05-05 |
| 8671366 | Estimating shape based on comparison between actual waveform and library in lithography process | Maki Tanaka, Chie Shishido, Mayuka Osaki | 2014-03-11 |
| 8148682 | Method and apparatus for pattern position and overlay measurement | Shoji Hotta | 2012-04-03 |
| 8085870 | Transmitter | Takashi Okada, Jun Watanabe, Takahiro Todate | 2011-12-27 |
| 7974581 | Transmitter | Takashi Okada, Jun Watanabe, Takahiro Todate | 2011-07-05 |
| 7529316 | Transmitter | Tetsuhiko Miyatani, Yoshihiko Akaiwa | 2009-05-05 |
| 7489907 | Transmitter for suppressing a variation in input level of a multicarrier signal | Tetsuhiko Miyatani, Hisashi Kawai, Masami Yoshida, Jun Watanabe | 2009-02-10 |
| 7387867 | Manufacturing method of semiconductor integrated circuit device | Katsuya Hayano, Shoji Hotta | 2008-06-17 |
| 7361530 | Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light | Tsuneo Terasawa, Toshihiko Tanaka, Ko Miyazaki, Kazutaka Mori | 2008-04-22 |
| 7252910 | Fabrication method of semiconductor integrated circuit device and mask fabrication method | Katsuya Hayano, Shinji Kubo, Yasuhiro Koizumi, Yasushi Kawai | 2007-08-07 |
| 7205222 | Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light | Tsuneo Terasawa, Toshihiko Tanaka, Ko Miyazaki, Kazutaka Mori | 2007-04-17 |
| 7172853 | Method of manufacturing semiconductor integrated circuit devices | Akira Imai, Katsuya Hayano | 2007-02-06 |
| 7125651 | Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks | Tsuneo Terasawa, Toshihiko Tanaka | 2006-10-24 |