Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7252910 | Fabrication method of semiconductor integrated circuit device and mask fabrication method | Norio Hasegawa, Katsuya Hayano, Shinji Kubo, Yasushi Kawai | 2007-08-07 |
| 6879393 | Defect inspection apparatus for phase shift mask | Shiaki Murai, Shigeru Noguchi, Katsuhide Tsuchiya | 2005-04-12 |
| 6863018 | Ion plating device and ion plating method | Kouichi Nose, Isao Tokomoto | 2005-03-08 |
| 6841399 | Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device | Norio Hasegawa, Katsuya Hayano, Shinji Kubo, Hironobu Takaya, Morihisa Hoga | 2005-01-11 |
| 6831413 | Plasma display panel | Hiroshi Kajiyama, Akira Katou, Kenichi Onisawa, Tetsuro Minemura, Kazuo Uetani +4 more | 2004-12-14 |
| 6816134 | Plasma display panel | Hiroshi Kajiyama, Akira Katou, Kenichi Onisawa, Tetsuro Minemura, Kazuo Uetani +4 more | 2004-11-09 |
| 6579428 | Arc evaporator, method for driving arc evaporator, and ion plating apparatus | Shirou Takigawa, Kouichi Nose, Takanobu Hori, Yukio Miya | 2003-06-17 |
| 6476387 | Method and apparatus for observing or processing and analyzing using a charged beam | Norimasa Nishimura, Akira Shimase, Junzou Azuma, Yuichi Hamamura, Michinobu Mizumura +1 more | 2002-11-05 |
| 6303932 | Method and its apparatus for detecting a secondary electron beam image and a method and its apparatus for processing by using focused charged particle beam | Yuichi Hamamura, Akira Shimase, Junzou Azuma, Michinobu Mizumura, Norimasa Nishimura +1 more | 2001-10-16 |
| 5786112 | Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask | Yoshihiko Okamoto | 1998-07-28 |
| 5447614 | Method of processing a sample using a charged beam and reactive gases and system employing the same | Yuuichi Hamamura, Satoshi Haraichi, Akira Shimase, Junzou Azuma, Fumikazu Itoh +2 more | 1995-09-05 |
| 5439763 | Optical mask and method of correcting the same | Akira Shimase, Junzou Azuma, Satoshi Haraichi, Fumikazu Itoh | 1995-08-08 |
| 5358806 | Phase shift mask, method of correcting the same and apparatus for carrying out the method | Satoshi Haraichi, Fumikazu Itoh, Akira Shimase, Hiroshi Yamaguchi, Junzou Azuma | 1994-10-25 |
| 5342448 | Apparatus for processing a sample using a charged beam and reactive gases | Yuuichi Hamamura, Satoshi Haraichi, Akira Shimase, Junzou Azuma, Fumikazu Itoh +2 more | 1994-08-30 |
| 4704348 | Exposure of uniform fine pattern on photoresist | Soichi Torisawa, Walter Gartner, Gudrun Dietz, Wolfgang Retschke | 1987-11-03 |
| 4609566 | Method and apparatus for repairing defects on a photo-mask pattern | Mikio Hongo, Katsurou Mizukoshi, Tateoki Miyauchi, Takao Kawanabe | 1986-09-02 |