Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9209054 | Device manufacturing apparatus | Shiro Hara, Akira Ishibashi | 2015-12-08 |
| 6753253 | Method of making wiring and logic corrections on a semiconductor device by use of focused ion beams | Takahiko Takahashi, Fumikazu Itoh, Akira Shimase, Mikio Hongo, Hiroshi Yamaguchi | 2004-06-22 |
| 5824598 | IC wiring connecting method using focused energy beams | Hiroshi Yamaguchi, Mikio Hongo, Tateoki Miyauchi, Akira Shimase, Takahiko Takahashi +1 more | 1998-10-20 |
| 5683547 | Processing method and apparatus using focused energy beam | Junzou Azuma, Fumikazu Itoh, Akira Shimase, Junichi Mori, Takahiko Takahashi +1 more | 1997-11-04 |
| 5497034 | IC wiring connecting method and apparatus | Hiroshi Yamaguchi, Mikio Hongo, Tateoki Miyauchi, Akira Shimase, Takahiko Takahashi +1 more | 1996-03-05 |
| 5472507 | IC wiring connecting method and apparatus | Hiroshi Yamaguchi, Mikio Hongo, Tateoki Miyauchi, Akira Shimase, Takahiko Takahashi +1 more | 1995-12-05 |
| 5447614 | Method of processing a sample using a charged beam and reactive gases and system employing the same | Yuuichi Hamamura, Akira Shimase, Junzou Azuma, Fumikazu Itoh, Toshio Yamada +2 more | 1995-09-05 |
| 5439763 | Optical mask and method of correcting the same | Akira Shimase, Junzou Azuma, Fumikazu Itoh, Yasuhiro Koizumi | 1995-08-08 |
| 5358806 | Phase shift mask, method of correcting the same and apparatus for carrying out the method | Fumikazu Itoh, Akira Shimase, Hiroshi Yamaguchi, Junzou Azuma, Yasuhiro Koizumi | 1994-10-25 |
| 5342448 | Apparatus for processing a sample using a charged beam and reactive gases | Yuuichi Hamamura, Akira Shimase, Junzou Azuma, Fumikazu Itoh, Toshio Yamada +2 more | 1994-08-30 |
| 5229607 | Combination apparatus having a scanning electron microscope therein | Hironobu Matsui, Mikio Ichihashi, Sumio Hosaka, Yoshinori Nakayama, Fumikazu Itoh +9 more | 1993-07-20 |
| 5223109 | Ion beam processing method and apparatus | Fumikazu Itoh, Akira Shimase, Junzou Azuma | 1993-06-29 |
| 5086015 | Method of etching a semiconductor device by an ion beam | Fumikazu Itoh, Akira Shimase, Takahiko Takahashi, Mikio Hongo | 1992-02-04 |
| 5055696 | Multilayered device micro etching method and system | Fumikazu Itoh, Akira Shimase, Takahiko Takahashi | 1991-10-08 |
| 5026664 | Method of providing a semiconductor IC device with an additional conduction path | Mikio Hongo, Katsuro Mizukoshi, Shuzo Sano, Takashi Kamimura, Fumikazu Itoh +2 more | 1991-06-25 |
| 4933565 | Method and apparatus for correcting defects of X-ray mask | Hiroshi Yamaguchi, Keiya Saito, Mitsuyoshi Koizumi, Akira Shimase, Tateoki Miyauchi +2 more | 1990-06-12 |
| 4925755 | Method of correcting defect in circuit pattern | Hiroshi Yamaguchi, Keiya Saito, Akira Shimase, Susumu Aiuchi, Nobuyuki Akiyama +2 more | 1990-05-15 |
| 4900695 | Semiconductor integrated circuit device and process for producing the same | Takahiko Takahashi, Funikazu Itoh, Akira Shimase, Hiroshi Yamaguchi, Mikio Hongo | 1990-02-13 |
| 4868068 | IC wiring connecting method and resulting article | Hiroshi Yamaguchi, Mikio Hongo, Tateoki Miyauchi, Akira Shimase, Takahiko Takahashi +1 more | 1989-09-19 |
| 4683378 | Apparatus for ion beam work | Akira Shimase, Hiroshi Yamaguchi, Tateoki Miyauchi | 1987-07-28 |