| 11007496 |
Method for manufacturing ultra-fine bubbles having oxidizing radical or reducing radical by resonance foaming and vacuum cavitation, and ultra-fine bubble water manufacturing device |
Chikashi KAMIMURA |
2021-05-18 |
| 10500553 |
Method for manufacturing ultra-fine bubbles having oxidizing radical or reducing radical by resonance foaming and vacuum cavitation, and ultra-fine bubble water manufacturing device |
Chikashi KAMIMURA |
2019-12-10 |
| 7322701 |
Projector |
Takehito Hiyoshi, Junichi Onodera |
2008-01-29 |
| 7312669 |
Oscillation circuit |
Masaki Kinoshita |
2007-12-25 |
| 7016773 |
Control system for hybrid vehicle |
Shigetaka Kuroda, Hiroshi Murakami, Akihito Ohtsu, Kiyoshi Asami, Naoki Tsuji |
2006-03-21 |
| 7013853 |
Valve control system for internal combustion engine |
Kiyoshi Asami, Shigetaka Kuroda, Hiroshi Murakami, Naoki Tsuji, Akihito Ohtsu |
2006-03-21 |
| 6427100 |
Motor control apparatus for hybrid vehicle |
Toshiaki Kaku |
2002-07-30 |
| 5825035 |
Processing method and apparatus using focused ion beam generating means |
Michinobu Mizumura, Yuuichi Hamamura, Junzou Azuma, Akira Shimase, Fumikazu Itoh +3 more |
1998-10-20 |
| 5759424 |
Plasma processing apparatus and processing method |
Mitsuko Imatake, Ichiro Sasaki, Toru Otsubo, Hitoshi Tamura |
1998-06-02 |
| 5656811 |
Method for making specimen and apparatus thereof |
Fumikazu Itoh, Toshihiko Nakata, Tohru Ishitani, Akira Shimase, Hiroshi Yamaguchi |
1997-08-12 |
| 5583344 |
Process method and apparatus using focused ion beam generating means |
Michinobu Mizumura, Yuuichi Hamamura, Junzou Azuma, Akira Shimase, Fumikazu Itoh +3 more |
1996-12-10 |
| 5504340 |
Process method and apparatus using focused ion beam generating means |
Michinobu Mizumura, Yuuichi Hamamura, Junzou Azuma, Akira Shimase, Fumikazu Itoh +3 more |
1996-04-02 |
| 5182231 |
Method for modifying wiring of semiconductor device |
Mikio Hongo, Katsuro Mizukoshi, Shyuzo Sano, Takahiko Takahashi |
1993-01-26 |
| 5026664 |
Method of providing a semiconductor IC device with an additional conduction path |
Mikio Hongo, Katsuro Mizukoshi, Shuzo Sano, Fumikazu Itoh, Akira Shimase +2 more |
1991-06-25 |
| 4808258 |
Plasma processing method and apparatus for carrying out the same |
Toru Otsubo, Susumu Aiuchi, Minoru Noguchi, Teru Fujii |
1989-02-28 |
| 4487678 |
Dry-etching apparatus |
Minori Noguchi, Toru Otsubo, Susumu Aiuchi, Teru Fujii |
1984-12-11 |
| 4479848 |
Etching method and apparatus |
Toru Otsubo, Susumu Aiuchi |
1984-10-30 |
