Issued Patents All Time
Showing 51–75 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6686107 | Method for producing a semiconductor device | Shunichi Matsumoto, Yasuhiro Yoshitake, Takeshi Kato | 2004-02-03 |
| 6686099 | Method of manufacturing a photomask | Toshihiko Tanaka, Tsuneo Terasawa | 2004-02-03 |
| 6677107 | Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor | Tsuneo Terasawa, Toshihiko Tanaka | 2004-01-13 |
| 6667135 | Method of manufacturing a photomask | Toshihiko Tanaka, Tsuneo Terasawa | 2003-12-23 |
| 6660438 | Method of manufacturing an electronic device and a semiconductor integrated circuit device | Toshihiko Tanaka | 2003-12-09 |
| 6656646 | Fabrication method of semiconductor integrated circuit device | Shoji Hotta | 2003-12-02 |
| 6656645 | Method of manufacturing a photomask | Toshihiko Tanaka, Tsuneo Terasawa | 2003-12-02 |
| 6656644 | Manufacturing method of photomask and photomask | Toshihiko Tanaka, Joji Okada, Kazutaka Mori, Ko Miyazaki | 2003-12-02 |
| 6653052 | Electron device manufacturing method, a pattern forming method, and a photomask used for those methods | Toshihiko Tanaka, Hiroshi Shiraishi, Hidetoshi Satoh | 2003-11-25 |
| 6649956 | Semiconductor integrated circuit device and manufacturing method thereof | Makoto Yoshida, Takahiro Kumauchi, Yoshitaka Tadaki, Isamu Asano, Keizo Kawakita | 2003-11-18 |
| 6645856 | Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate | Toshihiko Tanaka, Tsuneo Terasawa | 2003-11-11 |
| RE38296 | Semiconductor memory device with recessed array region | Noboru Moriuchi, Yoshiki Yamaguchi, Toshihiko Tanaka, Yoshifumi Kawamoto, Shin Kimura +2 more | 2003-11-04 |
| 6632744 | Manufacturing method of semiconductor integrated circuit device | Akira Imai, Katsuya Hayano | 2003-10-14 |
| 6617265 | Photomask and method for manufacturing the same | Toshihiko Tanaka | 2003-09-09 |
| 6596656 | Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM | Toshihiko Tanaka, Kazutaka Mori, Ko Miyazaki, Tsuneo Terasawa | 2003-07-22 |
| 6576379 | Phaseshift mask and manufacturing the same | Toshihiko Tanaka | 2003-06-10 |
| 6573546 | Semiconductor integrated circuit device and process for manufacturing the same | Kiyonori Ohyu, Makoto Ohkura, Aritoshi Sugimoto, Yoshitaka Tadaki, Makoto Ogasawara +2 more | 2003-06-03 |
| 6558855 | Phase shift mask and manufacturing the same | Toshihiko Tanaka | 2003-05-06 |
| 6548312 | Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods | Katsuya Hayano, Akira Imai, Naoko Asai, Eiji Tsujimoto, Takahiro Watanabe | 2003-04-15 |
| 6538855 | Magneto-resistive thin film magnetic head preventing entry of unnecessary magnetic flux and having good reproduction characteristics | Akira Nakamura, Morio Kondo, Yasuhiko Shinjo, Kenji Machida, Naoto Hayashi +3 more | 2003-03-25 |
| 6483136 | Semiconductor integrated circuit and method of fabricating the same | Makoto Yoshida, Takahiro Kumauchi, Yoshitaka Tadaki, Isamu Asano, Keizo Kawakita | 2002-11-19 |
| 6403413 | Manufacturing method of semiconductor integrated circuit device having a capacitor | Katsuya Hayano, Akira Imai | 2002-06-11 |
| 6383718 | Photomask and pattern forming method employing the same | Fumio Murai, Katsuya Hayano | 2002-05-07 |
| 6329112 | Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens | Hiroshi Fukuda, Seiichiro Shirai, Tsuneo Terasawa, Katsuya Hayano | 2001-12-11 |
| 6291847 | Semiconductor integrated circuit device and process for manufacturing the same | Kiyonori Ohyu, Makoto Ohkura, Aritoshi Sugimoto, Yoshitaka Tadaki, Makoto Ogasawara +2 more | 2001-09-18 |