Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7694526 | Shielding member and indoor unit of an air conditioner | Kiyoshi Inoue, Katsuhiro Wakihara, Toshiaki Yamada, Ikuhiro Yamada, Shiro Kashiwa | 2010-04-13 |
| 6555295 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | Toshihiko Tanaka, Shoichi Uchino | 2003-04-29 |
| 6548312 | Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods | Katsuya Hayano, Norio Hasegawa, Akira Imai, Eiji Tsujimoto, Takahiro Watanabe | 2003-04-15 |
| 6461776 | Resist pattern forming method using anti-reflective layer, with variable extinction coefficient | Toshihiko Tanaka, Shoichi Uchino | 2002-10-08 |
| 6355400 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | Toshihiko Tanaka, Shoichi Uchino | 2002-03-12 |
| 6255036 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | Toshihiko Tanaka, Shoichi Uchino | 2001-07-03 |
| 6225011 | Method for manufacturing semiconductor devices utilizing plurality of exposure systems | Yasuko Gotoh, Norio Hasegawa, Katsuya Hayano, Takashi Matsuzaka, Katsuhiro Kawasaki | 2001-05-01 |
| 6162588 | Resist pattern forming method using anti-reflective layer and method of etching using resist pattern | Toshihiko Tanaka, Shoichi Uchino | 2000-12-19 |
| 5985517 | Resist pattern forming method using anti-reflective layer resist | Toshihiko Tanaka, Shoichi Uchino | 1999-11-16 |
| 5935765 | Resist pattern forming method using anti-reflective layer with variable extinction coefficient | Toshihiko Tanaka, Shoichi Uchino | 1999-08-10 |
| 5846693 | Resist pattern forming method using anti-reflective layer with variable extinction coefficient | Toshihiko Tanaka, Shoichi Uchino | 1998-12-08 |
| 5733712 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | Toshihiko Tanaka, Shoichi Uchino | 1998-03-31 |