Issued Patents All Time
Showing 76–100 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6278148 | Semiconductor device having a shielding conductor | Takao Watanabe, Takuya Fukuda | 2001-08-21 |
| 6258513 | Photomask and pattern forming method employing the same | Fumio Murai, Katsuya Hayano | 2001-07-10 |
| 6225011 | Method for manufacturing semiconductor devices utilizing plurality of exposure systems | Yasuko Gotoh, Naoko Asai, Katsuya Hayano, Takashi Matsuzaka, Katsuhiro Kawasaki | 2001-05-01 |
| 6087074 | Photomask and pattern forming method employing the same | Fumio Murai, Katsuya Hayano | 2000-07-11 |
| RE36731 | Method of forming pattern and projection aligner for carrying out the same | Hiroshi Fukuda, Toshihiko Tanaka, Toshiei Kurosaki | 2000-06-13 |
| 6020109 | Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices | Yoshihiko Okamoto, Tsuneo Terasawa, Akira Imai, Shinji Okazaki | 2000-02-01 |
| 6013398 | Photomask and pattern forming method employing the same | Fumio Murai, Katsuya Hayano | 2000-01-11 |
| 5932395 | Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices | Yoshihiko Okamoto, Tsuneo Terasawa, Akira Imai, Shinji Okazaki | 1999-08-03 |
| 5902705 | Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices | Yoshihiko Okamoto, Tsuneo Terasawa, Akira Imai, Shinji Okazaki | 1999-05-11 |
| 5895741 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Tsuneo Terasawa, Hiroshi Fukuda, Katsuya Hayano, Akira Imai, Akemi Moniwa +1 more | 1999-04-20 |
| 5885735 | Mask having a phase shifter and method of manufacturing same | Akira Imai, Hiroshi Fukuda, Toshihiko Tanaka | 1999-03-23 |
| 5851703 | Photomask and pattern forming method employing the same | Fumio Murai, Katsuya Hayano | 1998-12-22 |
| 5791357 | Support jig for thin circular objects | — | 1998-08-11 |
| 5700601 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Tsuneo Terasawa, Hiroshi Fukuda, Katsuya Hayano, Akira Imai, Akemi Moniwa +1 more | 1997-12-23 |
| 5691115 | Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices | Yoshihiko Okamoto, Tsuneo Terasawa, Akira Imai, Shinji Okazaki | 1997-11-25 |
| 5677898 | Disc cartridge container and apparatus having a plurality of cartridges arranged for simultaneous shutter opening closing | Masayasu Itoh, Hideaki Kawashimo | 1997-10-14 |
| 5656400 | Photomask and pattern forming method employing the same | Fumio Murai, Katsuya Hayano | 1997-08-12 |
| 5656397 | Mask having a phase shifter and method of manufacturing same | Akira Imai, Hiroshi Fukuda, Toshihiko Tanaka | 1997-08-12 |
| 5580440 | Air fuel ratio sensory | Sadayasu Ueno, Naoki Minami, Kanemasa Sato, Shiro Oouchi | 1996-12-03 |
| 5578421 | Photomask and pattern forming method employing the same | Fumio Murai, Katsuya Hayano | 1996-11-26 |
| 5521032 | Exposure mask and method of manufacture thereof | Akira Imai | 1996-05-28 |
| 5429896 | Photomask and pattern forming method employing the same | Fumio Murai, Katsuya Hayano | 1995-07-04 |
| 5391441 | Exposure mask and method of manufacture thereof | Akira Imai | 1995-02-21 |
| 5362591 | Mask having a phase shifter and method of manufacturing same | Akira Imai, Hiroshi Fukuda, Toshihiko Tanaka | 1994-11-08 |
| 5328807 | Method of forming a pattern | Toshihiko Tanaka, Toshiaki Yamanaka, Akira Imai, Hiroshi Shiraishi, Takumi Ueno +1 more | 1994-07-12 |