CS

Chie Shishido

HH Hitachi High-Technologies: 44 patents #19 of 1,917Top 1%
HI Hitachi: 36 patents #629 of 28,497Top 3%
RT Renesas Technology: 1 patents #1,991 of 3,337Top 60%
Overall (All Time): #21,741 of 4,157,543Top 1%
82
Patents All Time

Issued Patents All Time

Showing 25 most recent of 82 patents

Patent #TitleCo-InventorsDate
10186399 Scanning electron microscope Mayuka Osaki, Maki Tanaka, Hitoshi Namai, Fumihiro Sasajima, Makoto Suzuki +1 more 2019-01-22
9852881 Scanning electron microscope system, pattern measurement method using same, and scanning electron microscope Takuma Yamamoto, Shinya Yamada, Maki Tanaka 2017-12-26
9671223 Pattern dimension measurement method using electron microscope, pattern dimension measurement system, and method for monitoring changes in electron microscope equipment over time Maki Tanaka, Katsuhiro Sasada 2017-06-06
9488815 Pattern evaluation method and pattern evaluation device Atsushi Miyamoto, Mayuka Osaki, Maki Kimura 2016-11-08
9354049 Shape measurement method, and system therefor Maki Tanaka, Atsushi Miyamoto, Akira Hamamatsu, Manabu Yano 2016-05-31
9188554 Pattern inspection device and pattern inspection method Shinya Murakami, Takashi Hiroi, Taku Ninomiya, Michio Nakano 2015-11-17
9019362 Charged particle beam device and a method of improving image quality of the same Jie Bai, Kenji Nakahira, Atsushi Miyamoto, Hideyuki Kazumi 2015-04-28
8953868 Defect inspection method and defect inspection apparatus Shinya Murakami, Takashi Hiroi, Taku Ninomiya, Tsuyoshi Minakawa, Atsushi Miyamoto 2015-02-10
8671366 Estimating shape based on comparison between actual waveform and library in lithography process Maki Tanaka, Norio Hasegawa, Mayuka Osaki 2014-03-11
8502144 Tool-to-tool matching control method and its system for scanning electron microscope Mayuka Oosaki, Hiroki Kawada, Tatsuya Maeda 2013-08-06
8502145 Electron microscope system and method for evaluating film thickness reduction of resist patterns Mayuka Iwasaki, Maki Tanaka 2013-08-06
8481936 Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system Maki Tanaka, Atsushi Miyamoto 2013-07-09
8357897 Charged particle beam device Atsushi Miyamoto, Mayuka Iwasaki, Tomofumi Nishiura, Go Kotaki 2013-01-22
8331651 Method and apparatus for inspecting defect of pattern formed on semiconductor device Tomofumi Nishiura, Atsushi Miyamoto, Takumichi Sutani 2012-12-11
8217348 Electron microscope system and method for evaluating film thickness reduction of resist patterns Mayuka Iwasaki, Maki Tanaka 2012-07-10
8207512 Charged particle beam apparatus and methods for capturing images using the same Mayuka Oosaki, Mitsugu Sato, Hiroki Kawada, Tatsuya Maeda 2012-06-26
8110800 Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system Maki Tanaka, Atsushi Miyamoto 2012-02-07
8107717 Defect inspection method and apparatus Shunji Maeda, Kenji Oka, Yukihiro Shibata, Minoru Yoshida, Yuji Takagi +2 more 2012-01-31
8095896 Method and system of displaying an exposure condition Hirohito Koike, Hidetoshi Morokuma 2012-01-10
8045789 Method and apparatus for inspecting defect of pattern formed on semiconductor device Tomofumi Nishiura, Atsushi Miyamoto, Takumichi Sutani 2011-10-25
8022356 Sample and method for evaluating resolution of scanning electron microscope, and electron scanning microscope Mayuka Oosaki, Maki Tanaka, Hiroki Kawada 2011-09-20
8003940 Tool-to-tool matching control method and its system for scanning electron microscope Mayuka Oosaki, Hiroki Kawada, Tatsuya Maeda 2011-08-23
7957579 Pattern inspection method and apparatus Takashi Hiroi, Masahiro Watanabe, Aritoshi Sugimoto, Maki Tanaka, Hiroshi Miyai +2 more 2011-06-07
7916929 Defect inspection method and apparatus Shunji Maeda, Kenji Oka, Yukihiro Shibata, Minoru Yoshida, Yuji Takagi +2 more 2011-03-29
7894658 Pattern inspection method and apparatus Takashi Hiroi, Masahiro Watanabe, Aritoshi Sugimoto, Maki Tanaka, Hiroshi Miyai +2 more 2011-02-22