Issued Patents All Time
Showing 26–50 of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9400422 | Method for manufacturing photomask blank | Takashi Yoshii, Yoshio Kawai, Yukio Inazuki, Satoshi Watanabe, Akira Ikeda +1 more | 2016-07-26 |
| 9366951 | Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method | Yukio Inazuki, Toyohisa Sakurada, Takuro Kosaka, Kouhei Sasamoto | 2016-06-14 |
| 9164374 | Photomask making method, photomask blank and dry etching method | Shinichi Igarashi, Yukio Inazuki, Kazuhiro Nishikawa | 2015-10-20 |
| 8992788 | Evaluation of etching conditions for pattern-forming film | Shinichi Igarashi, Hiroki Yoshikawa, Yukio Inazuki | 2015-03-31 |
| 8980503 | Binary photomask blank and binary photomask making method | Hiroki Yoshikawa, Yukio Inazuki, Kazuhiro Nishikawa | 2015-03-17 |
| 8920666 | Etching method and photomask blank processing method | Shinichi Igarashi, Yukio Inazuki, Hiroki Yoshikawa, Yoshinori Kinase | 2014-12-30 |
| 8858814 | Photomask blank, processing method, and etching method | Satoshi Watanabe, Ryuji Koitabashi, Shinichi Igarashi, Yoshio Kawai, Shozo Shirai | 2014-10-14 |
| 8753787 | Light pattern exposure method, photomask, and photomask blank | Hiroki Yoshikawa, Yukio Inazuki, Ryuji Koitabashi, Yosuke Kojima, Takashi Haraguchi +1 more | 2014-06-17 |
| 8753786 | Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank | Hiroki Yoshikawa, Yukio Inazuki, Ryuji Koitabashi, Yosuke Kojima, Takashi Haraguchi +1 more | 2014-06-17 |
| 8647795 | Sputtering target material, silicon-containing film forming method, and photomask blank | Yokio Inazuki, Hiroki Yoshikawa | 2014-02-11 |
| 8475978 | Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film | Hiroki Yoshikawa, Yukio Inazuki, Ryuji Koitabashi, Takashi Haraguchi, Yosuke Kojima +1 more | 2013-07-02 |
| 8417018 | Method for inspecting and judging photomask blank or intermediate thereof | Yukio Inazuki, Hiroki Yoshikawa | 2013-04-09 |
| 8309277 | Photomask making method | Shinichi Igarashi, Yukio Inazuki, Hiroki Yoshikawa, Yoshinori Kinase | 2012-11-13 |
| 8304146 | Photomask making method, photomask blank and dry etching method | Shinichi Igarashi, Yukio Inazuki, Kazuhiro Nishikawa | 2012-11-06 |
| 8168351 | Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photomask blank | Yukio Inazuki, Hiroki Yoshikawa | 2012-05-01 |
| 8148036 | Photomask blank and photomask | Yukio Inazuki, Hiroki Yoshikawa | 2012-04-03 |
| 7736824 | Photomask blank, photomask, and method of manufacture | Hiroki Yoshikawa, Yukio Inazuki, Noriyasu Fukushima, Satoshi Okazaki | 2010-06-15 |
| 7632609 | Fabrication method of photomask-blank | Noriyasu Fukushima, Hiroki Yoshikawa, Yukio Inazuki | 2009-12-15 |
| 7514185 | Preparation of photomask blank and photomask | Noriyasu Fukushima, Hiroki Yoshikawa | 2009-04-07 |
| 7344806 | Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask | Hiroki Yoshikawa, Yukio Inazuki, Noriyasu Fukushima, Satoshi Okazaki | 2008-03-18 |
| 7329474 | Photomask blank, photomask, and method of manufacture | Hiroki Yoshikawa, Yukio Inazuki, Noriyasu Fukushima, Satoshi Okazaki | 2008-02-12 |
| 7264908 | Photo mask blank and photo mask | Tetsushi Tsukamoto | 2007-09-04 |
| 7195846 | Methods of manufacturing photomask blank and photomask | Yukio Inazuki, Tetsushi Tsukamoto, Masayuki Mogi, Katsuya Okumura | 2007-03-27 |
| 7179567 | Phase shift mask blank, phase shift mask, and method of manufacture | Yukio Inazuki, Masayuki Nakatsu, Tsuneo Numanami, Atsushi Tajika, Satoshi Okazaki | 2007-02-20 |
| 7037625 | Phase shift mask blank and method of manufacture | Yukio Inazuki, Tetsushi Tsukamoto, Satoshi Okazaki | 2006-05-02 |