MM

Masayuki Mogi

SC Shin-Etsu Chemical Co.: 5 patents #647 of 2,176Top 30%
NI Nikon: 4 patents #874 of 2,493Top 40%
KT Kabushiki Kaisha Toshiba: 2 patents #9,982 of 21,451Top 50%
Overall (All Time): #1,029,356 of 4,157,543Top 25%
5
Patents All Time

Issued Patents All Time

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
7351504 Photomask blank substrate, photomask blank and photomask Masayuki Nakatsu, Tsuneo Numanami, Masamitsu Itoh, Tsuneyuki Hagiwara, Naoto Kondo 2008-04-01
7344808 Method of making photomask blank substrates Tsuneo Numanami, Masayuki Nakatsu, Tsuneyuki Hagiwara, Naoto Kondo 2008-03-18
7329475 Method of selecting photomask blank substrates Masayuki Nakatsu, Tsuneo Numanami, Masamitsu Itoh, Tsuneyuki Hagiwara, Naoto Kondo 2008-02-12
7195846 Methods of manufacturing photomask blank and photomask Hideo Kaneko, Yukio Inazuki, Tetsushi Tsukamoto, Katsuya Okumura 2007-03-27
7070888 Method of selecting photomask blank substrates Masayuki Nakatsu, Tsuneo Numanami, Tsuneyuki Hagiwara, Naoto Kondo 2006-07-04