TH

Tsuneyuki Hagiwara

NI Nikon: 38 patents #69 of 2,493Top 3%
KT Kabushiki Kaisha Toshiba: 5 patents #5,683 of 21,451Top 30%
SC Shin-Etsu Chemical Co.: 4 patents #740 of 2,176Top 35%
SC Shin-Etsu Handotai Co.: 3 patents #210 of 679Top 35%
Overall (All Time): #85,376 of 4,157,543Top 3%
38
Patents All Time

Issued Patents All Time

Showing 25 most recent of 38 patents

Patent #TitleCo-InventorsDate
11928794 Image processing device, image processing program, image processing method, and imaging device 2024-03-12
10025194 Exposure apparatus, exposure method, and method for producing device Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Yasushi Mizuno +3 more 2018-07-17
9513558 Exposure apparatus, exposure method, and method for producing device Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Yasushi Mizuno +3 more 2016-12-06
8749759 Exposure apparatus, exposure method, and method for producing device Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Yasushi Mizuno +3 more 2014-06-10
8305553 Exposure apparatus and device manufacturing method Katsushi Nakano 2012-11-06
8139198 Exposure apparatus, exposure method, and method for producing device Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Yasushi Mizuno +3 more 2012-03-20
7965387 Image plane measurement method, exposure method, device manufacturing method, and exposure apparatus 2011-06-21
7791718 Measurement method, exposure method, and device manufacturing method 2010-09-07
7566893 Best focus detection method, exposure method, and exposure apparatus Naota Konda 2009-07-28
7474386 Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method Tadahito Fujisawa, Soichi Inoue, Makoto Kobayashi, Masashi Ichikawa, Kenichi Kodama 2009-01-06
7365830 Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method Tadahito Fujisawa, Soichi Inoue, Makoto Kobayashi, Masashi Ichikawa, Kenichi Kodama 2008-04-29
7351504 Photomask blank substrate, photomask blank and photomask Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Masamitsu Itoh, Naoto Kondo 2008-04-01
7344808 Method of making photomask blank substrates Tsuneo Numanami, Masayuki Nakatsu, Masayuki Mogi, Naoto Kondo 2008-03-18
7329475 Method of selecting photomask blank substrates Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Masamitsu Itoh, Naoto Kondo 2008-02-12
7230680 Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method Tadahito Fujisawa, Soichi Inoue, Makoto Kobayashi, Masashi Ichikawa, Kenichi Kodama 2007-06-12
7081946 Holding apparatus, holding method, exposure apparatus and device manufacturing method Hiromitsu Yoshimoto, Hiroto Horikawa, Hideo Mizutani 2006-07-25
7070888 Method of selecting photomask blank substrates Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Naoto Kondo 2006-07-04
6992751 Scanning exposure apparatus Shinichi Okita 2006-01-31
6727980 Apparatus and method for pattern exposure and method for adjusting the apparatus Kazuya Ota, Akikazu Tanimoto, Hideki Komatsuda, Takashi Mori 2004-04-27
6538721 Scanning exposure apparatus Shinichi Okita 2003-03-25
6381004 Exposure apparatus and device manufacturing method Hideyuki Tashiro 2002-04-30
5907396 Optical detection system for detecting defects and/or particles on a substrate Koichiro Komatsu, Hideyuki Tashiro 1999-05-25
5838433 Apparatus for detecting defects on a mask 1998-11-17
5798831 Defect inspecting apparatus and defect inspecting method 1998-08-25
5790251 Defect inspecting apparatus 1998-08-04