Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8373845 | Exposure control apparatus, manufacturing method of semiconductor device, and exposure apparatus | — | 2013-02-12 |
| 7855047 | Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device | Masafumi Asano, Satoshi Tanaka | 2010-12-21 |
| 7794899 | Photo mask, exposure method using the same, and method of generating data | Koji Hashimoto, Yuko Kono, Takashi Obara | 2010-09-14 |
| 7716617 | Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device | Hiromitsu Mashita, Toshiya Kotani, Atsushi Maesono, Ayako Nakano | 2010-05-11 |
| 7700997 | Semiconductor memory device | Takuya Futatsuyama, Toshiya Kotani, Hiromitsu Mashita, Atsushi Maesono, Ayako Nakano | 2010-04-20 |
| 7682757 | Pattern layout for forming integrated circuit | Hiromitsu Mashita, Minoru Inomoto, Koji Hashimoto, Yasunobu Kai | 2010-03-23 |
| 7669172 | Pattern creation method, mask manufacturing method and semiconductor device manufacturing method | Takeshi Ito, Satoshi Tanaka, Toshiya Kotani, Koji Hashimoto | 2010-02-23 |
| 7662523 | Photo mask, exposure method using the same, and method of generating data | Koji Hashimoto, Yuko Kono, Takashi Obara | 2010-02-16 |
| 7655369 | Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device | Masafumi Asano, Satoshi Tanaka | 2010-02-02 |
| 7636910 | Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device | Yukiyasu Arisawa, Shoji Mimotogi | 2009-12-22 |
| 7585597 | Mask pattern data generating method, photo mask manufacturing method, and semiconductor device manufacturing method | Takeshi Ito, Toshiya Kotani | 2009-09-08 |
| 7510341 | Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus | Kei Hayasaki, Daizo Mutoh, Masafumi Asano, Tsuyoshi Shibata, Shinichi Ito | 2009-03-31 |
| 7474386 | Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | Soichi Inoue, Makoto Kobayashi, Masashi Ichikawa, Tsuneyuki Hagiwara, Kenichi Kodama | 2009-01-06 |
| 7426711 | Mask pattern data forming method, photomask and method of manufacturing semiconductor device | Takeshi Ito, Takashi Obara | 2008-09-16 |
| 7396621 | Exposure control method and method of manufacturing a semiconductor device | Soichi Inoue, Satoshi Tanaka, Masafumi Asano | 2008-07-08 |
| 7384712 | Photo mask, exposure method using the same, and method of generating data | Koji Hashimoto, Yuko Kono, Takashi Obara | 2008-06-10 |
| 7368209 | Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device | Eishi Shiobara, Kei Hayasaki, Shinichi Ito | 2008-05-06 |
| 7365830 | Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | Soichi Inoue, Makoto Kobayashi, Masashi Ichikawa, Tsuneyuki Hagiwara, Kenichi Kodama | 2008-04-29 |
| 7250235 | Focus monitor method and mask | Kyoko Izuha, Masafumi Asano | 2007-07-31 |
| 7230680 | Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | Soichi Inoue, Makoto Kobayashi, Masashi Ichikawa, Tsuneyuki Hagiwara, Kenichi Kodama | 2007-06-12 |
| 7175943 | Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device | Masafumi Asano, Satoshi Tanaka | 2007-02-13 |
| 7108945 | Photomask having a focus monitor pattern | Takumichi Sutani, Kyoko Izuha, Soichi Inoue | 2006-09-19 |
| 6919153 | Dose monitoring method and manufacturing method of semiconductor device | Soichi Inoue, Takashi Sato, Masafumi Asano | 2005-07-19 |
| 6813001 | Exposure method and apparatus | Masafumi Asano, Tatsuhiko Higashiki | 2004-11-02 |
| 6741334 | Exposure method, exposure system and recording medium | Masafumi Asano, Kyoko Izuha | 2004-05-25 |