Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8071157 | Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus | Shinichi Ito, Tatsuhiko Ema, Rempei Nakata, Nobuhide Yamada, Katsuya Okumura | 2011-12-06 |
| 7972765 | Pattern forming method and a semiconductor device manufacturing method | Kenji Kawano, Tsuyoshi Shibata | 2011-07-05 |
| 7968272 | Semiconductor device manufacturing method to form resist pattern | Daisuke Kawamura, Eishi Shiobara, Tomoyuki Takeishi, Yasunobu Onishi, Shinichi Ito +1 more | 2011-06-28 |
| 7903264 | Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus | Toru Mikami, Shinichi Ito, Yuichiro Yamazaki, Toshiya Kotani | 2011-03-08 |
| 7794923 | Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device | Eishi Shiobara, Kentaro Matsunaga, Daisuke Kawamura, Tomoyuki Takeishi, Shinichi Ito | 2010-09-14 |
| 7683291 | Substrate processing method and manufacturing method of semiconductor device | Tsuyoshi Shibata, Koutarou Sho, Shinichi Ito | 2010-03-23 |
| 7669608 | Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle | Shinichi Ito, Tatsuhiko Ema, Riichiro Takahashi | 2010-03-02 |
| 7662546 | Apparatus for processing substrate and method of processing the same | Kenji Kawano, Shinichi Ito, Eishi Shiobara, Daisuke Kawamura | 2010-02-16 |
| 7604832 | Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus | Shinichi Ito, Tatsuhiko Ema, Rempei Nakata, Nobuhide Yamada, Katsuya Okumura | 2009-10-20 |
| 7563561 | Pattern forming method and a semiconductor device manufacturing method | Kenji Kawano, Tsuyoshi Shibata | 2009-07-21 |
| 7510341 | Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus | Daizo Mutoh, Masafumi Asano, Tadahito Fujisawa, Tsuyoshi Shibata, Shinichi Ito | 2009-03-31 |
| 7483155 | Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus | Toru Mikami, Shinichi Ito, Yuichiro Yamazaki, Toshiya Kotani | 2009-01-27 |
| 7399578 | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method | Riichiro Takahashi, Tomoyuki Takeishi, Shinichi Ito | 2008-07-15 |
| 7368209 | Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device | Eishi Shiobara, Tadahito Fujisawa, Shinichi Ito | 2008-05-06 |
| 7364839 | Method for forming a pattern and substrate-processing apparatus | Shinichi Ito, Tomoyuki Takeishi, Kenji Kawano, Tatsuhiko Ema | 2008-04-29 |
| 7327436 | Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product | Kazuya Fukuhara, Satoshi Tanaka, Kenji Chiba, Kenji Kawano | 2008-02-05 |
| 7312018 | Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus | Shinichi Ito, Tatsuhiko Ema, Rempei Nakata, Nobuhide Yamada, Katsuya Okumura | 2007-12-25 |
| 7097960 | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method | Riichiro Takahashi, Tomoyuki Takeishi, Shinichi Ito | 2006-08-29 |
| 7018481 | Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle | Shinichi Ito, Tatsuhiko Ema, Riichiro Takahashi | 2006-03-28 |
| 7005238 | Apparatus for processing substrate and method of processing the same | Kenji Kawano, Shinichi Ito, Eishi Shiobara, Daisuke Kawamura | 2006-02-28 |
| 7005249 | Apparatus for processing substrate and method of processing the same | Kenji Kawano, Shinichi Ito, Eishi Shiobara, Daisuke Kawamura | 2006-02-28 |
| 6881058 | Apparatus for processing substrate and method of processing the same | Kenji Kawano, Shinichi Ito, Eishi Shiobara, Daisuke Kawamura | 2005-04-19 |
| 6831258 | Heating device, method for evaluating heating device and pattern forming method | Shinichi Ito, Kenji Kawano | 2004-12-14 |
| 6818387 | Method of forming a pattern | Riichiro Takahashi, Shinichi Ito | 2004-11-16 |
| 6800569 | Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus | Shinichi Ito, Tatsuhiko Ema, Rempei Nakata, Nobuhide Yamada, Katsuya Okumura | 2004-10-05 |