Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12400981 | Method for manufacturing semiconductor device | Hiroaki ASHIDATE | 2025-08-26 |
| 10350624 | Coating apparatus and coating method | — | 2019-07-16 |
| 9897918 | Pattern forming method and manufacturing method of semiconductor device | Hirokazu Kato, Shinichi Ito | 2018-02-20 |
| 9601331 | Pattern forming method and manufacturing method of semiconductor device | Hirokazu Kato, Shinichi Ito | 2017-03-21 |
| 9535328 | Developing apparatus and developing method | — | 2017-01-03 |
| 9202722 | Pattern forming method and manufacturing method of semiconductor device | Hirokazu Kato, Shinichi Ito | 2015-12-01 |
| 8728943 | Pattern forming method and manufacturing method of semiconductor device | Hirokazu Kato, Shinichi Ito | 2014-05-20 |
| 8084194 | Substrate edge treatment for coater/developer | Yuji Kobayashi | 2011-12-27 |
| 7968272 | Semiconductor device manufacturing method to form resist pattern | Daisuke Kawamura, Eishi Shiobara, Kei Hayasaki, Yasunobu Onishi, Shinichi Ito +1 more | 2011-06-28 |
| 7851363 | Pattern forming method and manufacturing method of semiconductor device | Hirokazu Kato, Shinichi Ito | 2010-12-14 |
| 7794923 | Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device | Eishi Shiobara, Kentaro Matsunaga, Daisuke Kawamura, Kei Hayasaki, Shinichi Ito | 2010-09-14 |
| 7727853 | Processing method, manufacturing method of semiconductor device, and processing apparatus | Kenji Kawano, Hiroshi Ikegami, Shinichi Ito, Riichiro Takahashi | 2010-06-01 |
| 7709383 | Film forming method, and substrate-processing apparatus | Hirokazu Kato, Shinichi Ito | 2010-05-04 |
| 7527918 | Pattern forming method and method for manufacturing a semiconductor device | Takehiro Kondoh, Eishi Shiobara, Kenji Chiba, Shinichi Ito | 2009-05-05 |
| 7399578 | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method | Riichiro Takahashi, Kei Hayasaki, Shinichi Ito | 2008-07-15 |
| 7364839 | Method for forming a pattern and substrate-processing apparatus | Kei Hayasaki, Shinichi Ito, Kenji Kawano, Tatsuhiko Ema | 2008-04-29 |
| 7288466 | Processing method, manufacturing method of semiconductor device, and processing apparatus | Kenji Kawano, Hiroshi Ikegami, Shinichi Ito, Riichiro Takahashi | 2007-10-30 |
| 7097960 | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method | Riichiro Takahashi, Kei Hayasaki, Shinichi Ito | 2006-08-29 |
| 6742944 | ALKALINE SOLUTION AND MANUFACTURING METHOD, AND ALKALINE SOLUTION APPLIED TO PATTERN FORMING METHOD, RESIST FILM REMOVING METHOD, SOLUTION APPLICATION METHOD, SUBSTRATE TREATMENT METHOD, SOLUTION SUPPLY METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | Riichiro Takahashi, Kei Hayasaki, Shinichi Ito | 2004-06-01 |