Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7727853 | Processing method, manufacturing method of semiconductor device, and processing apparatus | Tomoyuki Takeishi, Kenji Kawano, Hiroshi Ikegami, Shinichi Ito | 2010-06-01 |
| 7669608 | Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle | Kei Hayasaki, Shinichi Ito, Tatsuhiko Ema | 2010-03-02 |
| 7399578 | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method | Kei Hayasaki, Tomoyuki Takeishi, Shinichi Ito | 2008-07-15 |
| 7288466 | Processing method, manufacturing method of semiconductor device, and processing apparatus | Tomoyuki Takeishi, Kenji Kawano, Hiroshi Ikegami, Shinichi Ito | 2007-10-30 |
| 7097960 | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method | Kei Hayasaki, Tomoyuki Takeishi, Shinichi Ito | 2006-08-29 |
| 7067033 | Chemical liquid processing apparatus for processing a substrate | Shinichi Ito, Tatsuhiko Ema, Katsuya Okamura | 2006-06-27 |
| 7018481 | Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle | Kei Hayasaki, Shinichi Ito, Tatsuhiko Ema | 2006-03-28 |
| 6842281 | Observation device, ultraviolet microscope and observation method | Atsushi Tsurumune, Jiro Mizuno, Shinichi Ito, Tatsuhiko Ema | 2005-01-11 |
| 6818387 | Method of forming a pattern | Kei Hayasaki, Shinichi Ito | 2004-11-16 |
| 6742944 | ALKALINE SOLUTION AND MANUFACTURING METHOD, AND ALKALINE SOLUTION APPLIED TO PATTERN FORMING METHOD, RESIST FILM REMOVING METHOD, SOLUTION APPLICATION METHOD, SUBSTRATE TREATMENT METHOD, SOLUTION SUPPLY METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | Kei Hayasaki, Tomoyuki Takeishi, Shinichi Ito | 2004-06-01 |
| 6709531 | Chemical liquid processing apparatus for processing a substrate and the method thereof | Shinichi Ito, Tatsuhiko Ema, Katsuya Okamura | 2004-03-23 |