TE

Tatsuhiko Ema

KT Kabushiki Kaisha Toshiba: 14 patents #2,131 of 21,451Top 10%
NI Nikon: 1 patents #1,647 of 2,493Top 70%
📍 Kawasaki, NY: #19 of 20 inventorsTop 95%
Overall (All Time): #354,328 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
8071157 Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus Shinichi Ito, Kei Hayasaki, Rempei Nakata, Nobuhide Yamada, Katsuya Okumura 2011-12-06
7669608 Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle Kei Hayasaki, Shinichi Ito, Riichiro Takahashi 2010-03-02
7604832 Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus Shinichi Ito, Kei Hayasaki, Rempei Nakata, Nobuhide Yamada, Katsuya Okumura 2009-10-20
7364839 Method for forming a pattern and substrate-processing apparatus Kei Hayasaki, Shinichi Ito, Tomoyuki Takeishi, Kenji Kawano 2008-04-29
7312018 Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus Shinichi Ito, Kei Hayasaki, Rempei Nakata, Nobuhide Yamada, Katsuya Okumura 2007-12-25
7067033 Chemical liquid processing apparatus for processing a substrate Shinichi Ito, Riichiro Takahashi, Katsuya Okamura 2006-06-27
7018481 Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle Kei Hayasaki, Shinichi Ito, Riichiro Takahashi 2006-03-28
6842281 Observation device, ultraviolet microscope and observation method Atsushi Tsurumune, Jiro Mizuno, Shinichi Ito, Riichiro Takahashi 2005-01-11
6800569 Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus Shinichi Ito, Kei Hayasaki, Rempei Nakata, Nobuhide Yamada, Katsuya Okumura 2004-10-05
6719844 Deposition method, deposition apparatus, and pressure-reduction drying apparatus Shinichi Ito 2004-04-13
6709531 Chemical liquid processing apparatus for processing a substrate and the method thereof Shinichi Ito, Riichiro Takahashi, Katsuya Okamura 2004-03-23
6709699 Film-forming method, film-forming apparatus and liquid film drying apparatus Shinichi Ito, Katsuya Okumura 2004-03-23
6506453 Deposition method, deposition apparatus, and pressure-reduction drying apparatus Shinichi Ito 2003-01-14
6372413 Method for cleaning the surface of substrate to which residues of resist stick Shinichi Ito 2002-04-16