Issued Patents All Time
Showing 1–25 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11322332 | Apparatus and method for measuring energy spectrum of backscattered electrons | Makoto Kato, Sumio Sasaki, Yukihiro Tanaka | 2022-05-03 |
| 10515778 | Secondary particle detection system of scanning electron microscope | Sumio Sasaki, Susumu Takashima, Makoto Kato, Kazufumi Kubota, Yukihiro Tanaka | 2019-12-24 |
| 9862376 | Hybrid vehicle and control method therfor | — | 2018-01-09 |
| 9457798 | Hybrid vehicle and method for controlling same | Akio Futatsudera, Youichirou Fukao, Toshimi Kaneko, Masanori Matsushita, Naoyuki Tanaka +2 more | 2016-10-04 |
| 9368314 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2016-06-14 |
| 8831811 | Control unit for hybrid vehicle | — | 2014-09-09 |
| 8803103 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2014-08-12 |
| 8649591 | Pattern inspection apparatus and pattern inspection method | Makoto Kaneko, Takayoshi Fujii, Yusaku Konno, Mitsutoshi WATABIKI, Yusuke Ilda +1 more | 2014-02-11 |
| 8368031 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2013-02-05 |
| 8124933 | Mapping-projection-type electron beam apparatus for inspecting sample by using electrons emitted from the sample | Kenji Watanabe, Takeshi Murakami, Masahiro Hatakeyama, Yoshinao Hirabayashi, Tohru Satake +2 more | 2012-02-28 |
| 8067732 | Electron beam apparatus | Mamoru Nakasuji, Takeshi Murakami, Tohru Satake, Tsutomi Karimata, Toshifumi Kimba +4 more | 2011-11-29 |
| 8053726 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2011-11-08 |
| 8036445 | Pattern matching method, program and semiconductor device manufacturing method | Atsushi Onishi, Tadashi Mitsui | 2011-10-11 |
| 8035082 | Projection electron beam apparatus and defect inspection system using the apparatus | Ichirota Nagahama | 2011-10-11 |
| 8000046 | Storage device, processor or storage device, and computer program product for providing parameter adjustment during read/write operations | — | 2011-08-16 |
| 7903264 | Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus | Kei Hayasaki, Toru Mikami, Shinichi Ito, Toshiya Kotani | 2011-03-08 |
| 7863580 | Electron beam apparatus and an aberration correction optical apparatus | Masahiro Hatakeyama, Takeshi Murakami, Nobuharu Noji, Mamoru Nakasuji, Hirosi Sobukawa +3 more | 2011-01-04 |
| 7847250 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Ichirota Nagahama, Takamitsu Nagai, Motosuke Miyoshi | 2010-12-07 |
| 7777979 | Magnetic disk device testing method and testing device | Katsuji Suzuki | 2010-08-17 |
| 7674570 | Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device | Ichirota Nagahama, Atsushi Onishi | 2010-03-09 |
| 7645988 | Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus | Ichirota Nagahama, Atsushi Onishi | 2010-01-12 |
| 7608821 | Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method | Ichirota Nagahama, Atsushi Onishi | 2009-10-27 |
| 7609470 | Information storage device, write current adjustment method for the information storage device, and write control circuit | — | 2009-10-27 |
| 7592586 | Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample | Kenji Watanabe, Takeshi Murakami, Masahiro Hatakeyama, Yoshinao Hirabayashi, Tohru Satake +2 more | 2009-09-22 |
| 7569838 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa +7 more | 2009-08-04 |