Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11562883 | Electron microscope and beam irradiation method | — | 2023-01-24 |
| 9368314 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2016-06-14 |
| 8803103 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2014-08-12 |
| 8368031 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2013-02-05 |
| 8053726 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2011-11-08 |
| 7973281 | Semiconductor substrate, substrate inspection method, semiconductor device manufacturing method, and inspection apparatus | Hiroyuki Hayashi, Tomonobu Noda, Kenichi Kadota, Hisaki Kozaki | 2011-07-05 |
| 7847250 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Ichirota Nagahama, Yuichiro Yamazaki, Motosuke Miyoshi | 2010-12-07 |
| 7573066 | Semiconductor substrate, substrate inspection method, semiconductor device manufacturing method, and inspection apparatus | Hiroyuki Hayashi, Tomonobu Noda, Kenichi Kadota, Hisaki Kozaki | 2009-08-11 |
| 7569838 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa +7 more | 2009-08-04 |
| 7462829 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Ichirota Nagahama, Yuichiro Yamazaki, Motosuke Miyoshi | 2008-12-09 |
| 7411191 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2008-08-12 |
| 7351969 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa +7 more | 2008-04-01 |
| 7302091 | Method and apparatus for determining defect detection sensitivity data, control method of defect detection apparatus, and method and apparatus for detecting defect of semiconductor devices | Akira Hamaguchi | 2007-11-27 |
| 7241993 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba +9 more | 2007-07-10 |
| 7211796 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Ichirota Nagahama, Yuichiro Yamazaki, Motosuke Miyoshi | 2007-05-01 |
| 6992290 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa +7 more | 2006-01-31 |
| 6563114 | Substrate inspecting system using electron beam and substrate inspecting method using electron beam | Ichirota Nagahama, Yuuichiro Yamazaki, Motosuke Miyoshi | 2003-05-13 |
| 6265719 | Inspection method and apparatus using electron beam | Yuichiro Yamazaki, Motosuke Miyoshi | 2001-07-24 |
| 6259094 | Electron beam inspection method and apparatus | Yuichiro Yamazaki, Motosuke Miyoshi | 2001-07-10 |
| 5535508 | Method for producing an electrostatic lens | Yuichiro Yamazaki, Motosuke Miyoshi | 1996-07-16 |
| 5444256 | Electrostatic lens and method for producing the same | Yuichiro Yamazaki, Motosuke Miyoshi | 1995-08-22 |
| 5371371 | Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens | Yuichiro Yamazaki, Motosuke Miyoshi | 1994-12-06 |