Issued Patents All Time
Showing 1–25 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7847250 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Ichirota Nagahama, Yuichiro Yamazaki, Takamitsu Nagai | 2010-12-07 |
| 7649980 | X-ray source | Nobutada Aoki, Akiko Kakutani, Tsuyoshi Sugawara | 2010-01-19 |
| 7462829 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Ichirota Nagahama, Yuichiro Yamazaki, Takamitsu Nagai | 2008-12-09 |
| 7211796 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device | Ichirota Nagahama, Yuichiro Yamazaki, Takamitsu Nagai | 2007-05-01 |
| 7193221 | Electronic optical lens barrel and production method therefor | Katsuya Okumura | 2007-03-20 |
| 6991878 | Photomask repair method and apparatus | Shingo Kanamitsu, Takashi Hirano, Fumiaki Shigemitsu, Kazuyoshi Sugihara, Yuichiro Yamazaki +4 more | 2006-01-31 |
| 6815698 | Charged particle beam exposure system | Osamu Nagano, Yuichiro Yamazaki, Susumu Hashimoto | 2004-11-09 |
| 6768112 | Substrate inspection system and method for controlling same | Yuichiro Yamazaki | 2004-07-27 |
| 6563114 | Substrate inspecting system using electron beam and substrate inspecting method using electron beam | Ichirota Nagahama, Yuuichiro Yamazaki, Takamitsu Nagai | 2003-05-13 |
| 6563308 | Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded medium | Osamu Nagano, Yuichiro Yamazaki, Hisashi Kaneko, Tetsuo Matsuda | 2003-05-13 |
| 6525328 | Electron beam lithography system and pattern writing method | Yuichiro Yamazaki, Katsuya Okumura | 2003-02-25 |
| 6515296 | Pattern dimension measuring system and pattern dimension measuring method | Fumio Komatsu, Katsuya Okumura | 2003-02-04 |
| 6495841 | Charged beam drawing apparatus | Atsushi Ando, Shunko Magoshi, Kazuyoshi Sugihara, Yuichiro Yamazaki, Katsuya Okumura +1 more | 2002-12-17 |
| 6414323 | Charged particle beam apparatus and method of controlling charged particle beam | Hideaki Abe, Yuuichiro Yamazaki | 2002-07-02 |
| 6410439 | Semiconductor polishing apparatus and method for chemical/mechanical polishing of films | Masako Kodera, Takashi Yoda | 2002-06-25 |
| 6265719 | Inspection method and apparatus using electron beam | Yuichiro Yamazaki, Takamitsu Nagai | 2001-07-24 |
| 6259094 | Electron beam inspection method and apparatus | Takamitsu Nagai, Yuichiro Yamazaki | 2001-07-10 |
| 6171760 | Lithographic method utilizing charged particle beam exposure and fluorescent film | Yuichiro Yamazaki | 2001-01-09 |
| 6038018 | Substrate inspecting apparatus, substrate inspecting system having the same apparatus and substrate inspecting method | Yuichiro Yamazaki | 2000-03-14 |
| 5818217 | Electron beam irradiating apparatus and electric signal detecting apparatus | Fumio Komatsu, Katsuya Okumura | 1998-10-06 |
| 5639308 | Plasma apparatus | Yuichiro Yamazaki, Katsuya Okumura | 1997-06-17 |
| 5639699 | Focused ion beam deposition using TMCTS | Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more | 1997-06-17 |
| 5576833 | Wafer pattern defect detection method and apparatus therefor | Yuichiro Yamazaki | 1996-11-19 |
| 5569392 | Method and apparatus for repairing defect on plane surface of phase shift mask | Katsuya Okumura | 1996-10-29 |
| 5548183 | Magnetic field immersion type electron gun | Katsuya Okumura, Yuichiro Yamazaki | 1996-08-20 |