Issued Patents All Time
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10799917 | Substrate processing apparatus and substrate processing method | Yu Ishii, Hiroyuki Kawasaki, Kenichi Nagaoka, Kenya Ito, Hiroshi Tomita +1 more | 2020-10-13 |
| 10692206 | Crystal analysis apparatus and crystal analysis method | — | 2020-06-23 |
| 10586694 | Method for fabricating semiconductor device | Hiroshi Tomita, Takeshi Nishioka | 2020-03-10 |
| 10328465 | Substrate processing apparatus and substrate processing method | Yu Ishii, Hiroyuki Kawasaki, Kenichi Nagaoka, Kenya Ito, Hiroshi Tomita +1 more | 2019-06-25 |
| 10256314 | Semiconductor device | Tomoko Matsudai | 2019-04-09 |
| 9937602 | Substrate processing method | Yosuke OTSUKA, Yukiteru Matsui | 2018-04-10 |
| 9196501 | Method for chemical planarization and chemical planarization apparatus | Yukiteru Matsui | 2015-11-24 |
| 8754433 | Semiconductor device and method of manufacturing the same | Yukiteru Matsui, Gaku Minamihaba, Hajime Eda, Masayoshi Iwayama, Minoru Amano +3 more | 2014-06-17 |
| 8740667 | Polishing method and polishing apparatus | Yukiteru Matsui | 2014-06-03 |
| 8703004 | Method for chemical planarization and chemical planarization apparatus | Yukiteru Matsui, Hiroshi Tomita, Gaku Minamihaba, Akifumi GAWASE | 2014-04-22 |
| 8614510 | Semiconductor device including a metal wiring with a metal cap | Hideyuki Tomizawa, Noriaki Matsunaga, Tadayoshi Watanabe, Shiro Mishima | 2013-12-24 |
| 7727891 | Method of manufacturing a semiconductor device using a wet process | Yoshitaka Matsui | 2010-06-01 |
| 7101259 | Polishing method and apparatus | Norio Kimura, Mitsuhiko Shirakashi, Katsuhiko Tokushige, Masao Asami, Naoto Miyashita +3 more | 2006-09-05 |
| 6992009 | Method of manufacturing a semiconductor device | Yoshitaka Matsui | 2006-01-31 |
| 6903015 | Method of manufacturing a semiconductor device using a wet process | Yoshitaka Matsui | 2005-06-07 |
| 6783658 | Electropolishing method | Yoshitaka Matsui, Hiroshi Kosukegawa, Naoto Miyashita | 2004-08-31 |
| 6667238 | Polishing method and apparatus | Norio Kimura, Mitsuhiko Shirakashi, Katsuhiko Tokushige, Masao Asami, Naoto Miyashita +3 more | 2003-12-23 |
| 6419557 | Polishing method and polisher used in the method | Haruki Nojo, Rempei Nakata, Nobuo Hayasaka | 2002-07-16 |
| 6410439 | Semiconductor polishing apparatus and method for chemical/mechanical polishing of films | Takashi Yoda, Motosuke Miyoshi | 2002-06-25 |
| 6224464 | Polishing method and polisher used in the method | Haruki Nojo, Rempei Nakata, Nobuo Hayasaka | 2001-05-01 |
| 5948205 | Polishing apparatus and method for planarizing layer on a semiconductor wafer | Hiroyuki Yano, Atsushi Shigeta, Riichirou Aoki, Hiromi Yajima, Haruo Okano | 1999-09-07 |
| 5914275 | Polishing apparatus and method for planarizing layer on a semiconductor wafer | Hiroyuki Yano, Atsushi Shigeta, Riichirou Aoki, Hiromi Yajima, Haruo Okano | 1999-06-22 |
| 5860847 | Polishing apparatus | Kunihiko Sakurai, Tetsuji Togawa, Toyomi Nishi, Seiji Katsuoka, Hiromi Yajima | 1999-01-19 |
| 5860181 | Method of and apparatus for cleaning workpiece | Toshiro Maekawa, Satomi Hamada, Koji Ono, Atsushi Shigeta | 1999-01-19 |
| 5846335 | Method for cleaning workpiece | Toshiro Maekawa, Koji Ono, Motoaki Okada, Tamami Takahashi, Shiro Mishima +3 more | 1998-12-08 |