Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7708618 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Yukio Imoto, Shoichi Kodama, Riichiro Aoki, Takashi Omichi, Toyomi Nishi +1 more | 2010-05-04 |
| 7478347 | Semiconductor manufacturing apparatus, management apparatus therefor, component management apparatus therefor, and semiconductor wafer storage vessel transport apparatus | Tatsumi Suganuma, Noriaki Yoshikawa, Tadashi Yotsumoto, Kenji Nakata | 2009-01-13 |
| 7198552 | Polishing apparatus | Toyomi Nishi, Tetsuji Togawa, Harumitsu Saito, Manabu Tsujimura, Kazuaki Himukai +7 more | 2007-04-03 |
| 7065725 | Semiconductor manufacturing apparatus, management apparatus therefor, component management apparatus therefor, and semiconductor wafer storage vessel transport apparatus | Tatsumi Suganuma, Noriaki Yoshikawa, Tadashi Yotsumoto, Kenji Nakata | 2006-06-20 |
| 6997782 | Polishing apparatus and a method of polishing and cleaning and drying a wafer | Toyomi Nishi, Tetsuji Togawa, Harumitsu Saito, Manabu Tsujimura, Kazuaki Himukai +7 more | 2006-02-14 |
| 6966821 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Seiji Ishikawa, Manabu Tsujimura | 2005-11-22 |
| 6595220 | Apparatus for conveying a workpiece | Toshiro Maekawa, Satomi Hamada, Riichiro Aoki, Shoichi Kodama | 2003-07-22 |
| 6547638 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Seiji Ishikawa, Manabu Tsujimura | 2003-04-15 |
| 6500051 | Polishing apparatus and method | Toyomi Nishi, Tetsuji Togawa, Harumitsu Saito, Manabu Tsujimura, Kazuaki Himukai +7 more | 2002-12-31 |
| 6443808 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Seiji Ishikawa, Manabu Tsujimura | 2002-09-03 |
| 6439971 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Seiji Ishikawa, Manabu Tsujimura | 2002-08-27 |
| 6425806 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Seiji Ishikawa, Manabu Tsujimura | 2002-07-30 |
| 6413154 | Polishing apparatus | Tetsuji Togawa, Takeshi Sakurai, Nobuyuki Takada, Shoichi Kodama | 2002-07-02 |
| 6273802 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Seiji Ishikawa, Manabu Tsujimura | 2001-08-14 |
| 6227954 | Polishing apparatus | Tetsuji Togawa, Kuniaki Yamaguchi, Kunihiko Sakurai | 2001-05-08 |
| 6221171 | Method and apparatus for conveying a workpiece | Toshiro Maekawa, Satomi Hamada, Riichiro Aoki, Shoichi Kodama | 2001-04-24 |
| 6036582 | Polishing apparatus | Hideo Aizawa, Kenya Ito, Kenichi Shigeta, Yoshikuni Tateyama | 2000-03-14 |
| 5948205 | Polishing apparatus and method for planarizing layer on a semiconductor wafer | Masako Kodera, Hiroyuki Yano, Atsushi Shigeta, Riichirou Aoki, Haruo Okano | 1999-09-07 |
| 5914275 | Polishing apparatus and method for planarizing layer on a semiconductor wafer | Masako Kodera, Hiroyuki Yano, Atsushi Shigeta, Riichirou Aoki, Haruo Okano | 1999-06-22 |
| 5885138 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Riichirou Aoki, Seiji Ishikawa, Manabu Tsujimura | 1999-03-23 |
| 5860847 | Polishing apparatus | Kunihiko Sakurai, Tetsuji Togawa, Toyomi Nishi, Seiji Katsuoka, Masako Kodera | 1999-01-19 |
| 5827110 | Polishing facility | Yukio Imoto, Shoichi Kodama, Riichiro Aoki, Takashi Omichi, Toyomi Nishi +1 more | 1998-10-27 |
| 5704827 | Polishing apparatus including cloth cartridge connected to turntable | Toyomi Nishi, Manabu Tsujimura, Tamami Takahashi, Riichiro Aoki, Yukio Imoto +4 more | 1998-01-06 |
| 5695601 | Method for planarizing a semiconductor body by CMP method and an apparatus for manufacturing a semiconductor device using the method | Masako Kodera, Atsushi Shigeta, Shiro Mishima, Riichirou Aoki | 1997-12-09 |
| 5679059 | Polishing aparatus and method | Toyomi Nishi, Tetsuji Togawa, Harumitsu Saito, Manabu Tsujimura, Kazuaki Himukai +7 more | 1997-10-21 |