Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8685857 | Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device | Yukiteru Matsui, Gaku Minamihaba, Hiroyuki Yano, Atsushi Shigeta | 2014-04-01 |
| 8292694 | Substrate holding mechanism, substrate polishing apparatus and substrate polishing method | Tetsuji Togawa, Toshio Watanabe, Hiroyuki Yano, Gen Toyota, Kenji Iwade | 2012-10-23 |
| 8174125 | Manufacturing method of a semiconductor device | Nobuyuki Kurashima, Gaku Minamihaba, Dai Fukushima, Hiroyuki Yano | 2012-05-08 |
| 8078306 | Polishing apparatus and polishing method | Hidetaka Nakao, Eisaku Hayashi, Kunio Oishi, Isao Hayakawa, Yoshiaki Miyake +1 more | 2011-12-13 |
| 7985685 | Method of manufacturing semiconductor device | Yukiteru Matsui, Masako Kinoshita, Seiro Miyoshi, Takeshi Nishioka, Hiroyuki Yano | 2011-07-26 |
| 7951717 | Post-CMP treating liquid and manufacturing method of semiconductor device using the same | Nobuyuki Kurashima, Gaku Minamihaba, Hiroyuki Yano | 2011-05-31 |
| 7888139 | Fabricating method of nonvolatile semiconductor storage apparatus | Yukiteru Matsui, Takeo Kubota, Hiroyuki Kanaya, Yoshihiro Minami | 2011-02-15 |
| 7883394 | Substrate holding mechanism, substrate polishing apparatus and substrate polishing method | Tetsuji Togawa, Toshio Watanabe, Hiroyuki Yano, Gen Toyota, Kenji Iwade | 2011-02-08 |
| 7521350 | Manufacturing method of a semiconductor device | Nobuyuki Kurashima, Gaku Minamihaba, Dai Fukushima, Hiroyuki Yano | 2009-04-21 |
| 7452819 | Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device | Yukiteru Matsui, Gaku Minamihaba, Hiroyuki Yano, Atsushi Shigeta | 2008-11-18 |
| 7419420 | Substrate holding mechanism, substrate polishing apparatus and substrate polishing method | Tetsuji Togawa, Toshio Watanabe, Hiroyuki Yano, Gen Toyota, Kenji Iwade | 2008-09-02 |
| 7144804 | Semiconductor device and method of manufacturing the same | Gaku Minamihaba, Dai Fukushima, Hiroyuki Yano | 2006-12-05 |
| 7101801 | Method of manufacturing semiconductor device using chemical mechanical polishing | Takatoshi Ono, Naohito Mizuno, Tomoyuki Hirano | 2006-09-05 |
| 7042099 | Semiconductor device containing a dummy wire | Nobuyuki Kurashima, Gaku Minamihaba, Dai Fukushima, Hiroyuki Yano | 2006-05-09 |
| 6984582 | Method of making semiconductor device by polishing with intermediate clean polishing | Dai Fukushima, Gaku Minamihaba, Hiroyuki Yano | 2006-01-10 |
| 6858936 | Semiconductor device having an improved construction in the interlayer insulating film | Gaku Minamihaba, Dai Fukushima, Hiroyuki Yano | 2005-02-22 |
| 6835116 | Polishing apparatus | Shozo Oguri, Hideo Aizawa, Kenichi Shigeta | 2004-12-28 |
| 6645053 | Polishing apparatus | Norio Kimura, You Ishii | 2003-11-11 |
| 6561876 | CMP method and semiconductor manufacturing apparatus | Tomoyuki Hirano | 2003-05-13 |
| 6338744 | Polishing slurry and polishing method | Katsumi Yamamoto, Hiroshi Kato, Kazuhiko Hayashi, Hiroyuki Kono | 2002-01-15 |
| 6036582 | Polishing apparatus | Hideo Aizawa, Kenya Ito, Hiromi Yajima, Kenichi Shigeta | 2000-03-14 |
| 5664989 | Polishing pad, polishing apparatus and polishing method | Rempei Nakata, Hisashi Kaneko, Nobuo Hayasaka, Takeshi Nishioka, Yutaka Nakano +1 more | 1997-09-09 |