Issued Patents All Time
Showing 25 most recent of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11097397 | Polishing device, polishing method, and record medium | Takashi Watanabe, Takeshi Arakawa, Hiroaki Hayasaka, Tomonori Kawasaki | 2021-08-24 |
| 10441979 | Cleaning apparatus and cleaning method | Jun Takagi, Jun Takayasu | 2019-10-15 |
| 9902038 | Polishing apparatus, polishing method, and semiconductor manufacturing method | Jun Takayasu | 2018-02-27 |
| 9849558 | Polishing pad dresser, polishing apparatus and polishing pad dressing method | Takayuki Nakayama | 2017-12-26 |
| 9748090 | Semiconductor manufacturing apparatus and manufacturing method of semiconductor device | Shinichi Hirasawa | 2017-08-29 |
| 9539696 | Retainer ring, polish apparatus, and polish method | Takashi Watanabe, Jun Takayasu | 2017-01-10 |
| 9502318 | Polish apparatus, polish method, and method of manufacturing semiconductor device | Jun Takayasu, Takashi Watanabe | 2016-11-22 |
| 9296083 | Polishing apparatus and polishing method | Jun Takayasu, Takashi Watanabe | 2016-03-29 |
| 8778802 | Polishing method and method for fabricating semiconductor device | Gaku Minamihaba, Hiroyuki Yano | 2014-07-15 |
| 8506362 | Polishing apparatus and polishing method | Atsushi Shigeta, Tamami Takahashi, Kenya Ito, Masaya Seki, Hiroaki Kusa | 2013-08-13 |
| 8337715 | CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Nobuyuki Kurashima, Susumu Yamamoto, Hiroyuki Yano | 2012-12-25 |
| 8174125 | Manufacturing method of a semiconductor device | Nobuyuki Kurashima, Gaku Minamihaba, Yoshikuni Tateyama, Hiroyuki Yano | 2012-05-08 |
| 8152598 | Substrate treating method and substrate treating apparatus | Atsushi Shigeta | 2012-04-10 |
| 7842191 | CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Nobuyuki Kurashima, Susumu Yamamoto, Hiroyuki Yano | 2010-11-30 |
| 7833431 | Aqueous dispersion for CMP, polishing method and method for manufacturing semiconductor device | Gaku Minamihaba, Nobuyuki Kurashima, Yukiteru Matsui, Susumu Yamamoto, Hiroyuki Yano | 2010-11-16 |
| 7682975 | Semiconductor device fabrication method | Gaku Minamihaba, Hiroyuki Yano | 2010-03-23 |
| 7521350 | Manufacturing method of a semiconductor device | Nobuyuki Kurashima, Gaku Minamihaba, Yoshikuni Tateyama, Hiroyuki Yano | 2009-04-21 |
| 7494931 | Method for fabricating semiconductor device and polishing method | Gaku Minamihaba, Hiroyuki Yano, Nobuyuki Kurashima, Susumu Yamamoto | 2009-02-24 |
| 7465668 | Method of manufacturing semiconductor device | Gaku Minamihaba, Hiroyuki Yano | 2008-12-16 |
| 7419910 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Susumu Yamamoto, Hiroyuki Yano | 2008-09-02 |
| 7307023 | Polishing method of Cu film and method for manufacturing semiconductor device | Gaku Minamihaba, Hiroyuki Yano, Susumu Yamamoto | 2007-12-11 |
| 7144804 | Semiconductor device and method of manufacturing the same | Gaku Minamihaba, Yoshikuni Tateyama, Hiroyuki Yano | 2006-12-05 |
| 7042099 | Semiconductor device containing a dummy wire | Nobuyuki Kurashima, Gaku Minamihaba, Yoshikuni Tateyama, Hiroyuki Yano | 2006-05-09 |
| 6984582 | Method of making semiconductor device by polishing with intermediate clean polishing | Gaku Minamihaba, Hiroyuki Yano, Yoshikuni Tateyama | 2006-01-10 |
| 6935928 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | Kazuhito Uchikura, Kazuo Nishimoto, Masayuki Hattori, Nobuo Kawahashi, Hiroyuki Yano +3 more | 2005-08-30 |