Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7550020 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | Norihiko Ikeda, Kazuo Nishimoto, Masayuki Hattori | 2009-06-23 |
| 7498294 | Cleaning composition, method for cleaning semiconductor substrate, and process for manufacturing semiconductor device | Tomohisa Konno, Kiyonobu Kubota, Masayuki Hattori | 2009-03-03 |
| 7442116 | Chemical mechanical polishing pad | Hiroyuki Miyauchi, Hiroshi Shiho | 2008-10-28 |
| 7378349 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | Tomohisa Konno, Hirotaka Shida, Kiyonobu Kubota, Masayuki Hattori | 2008-05-27 |
| 7323415 | Polishing pad for semiconductor wafer, polishing multilayered body for semiconductor wafer having same, and method for polishing semiconductor wafer | Hiroshi Shiho, Yukio Hosaka, Kou Hasegawa | 2008-01-29 |
| 7252782 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | Norihiko Ikeda, Kazuo Nishimoto, Masayuki Hattori | 2007-08-07 |
| 7183213 | Chemical mechanical polishing pad and chemical mechanical polishing method | Hiroshi Shiho, Yukio Hosaka, Kou Hasegawa | 2007-02-27 |
| 7183211 | Process for chemical mechanical polishing of semiconductor substrate and aqueous dispersion for chemical mechanical polishing | Tomohisa Konno, Masayuki Motonari, Masayuki Hattori | 2007-02-27 |
| 7163448 | Chemical/mechanical polishing method for STI | Masayuki Hattori | 2007-01-16 |
| 7153369 | Method of chemical mechanical polishing | Masayuki Motonari, Masayuki Hattori | 2006-12-26 |
| 7090786 | Aqueous dispersion for chemical/mechanical polishing | Masayuki Hattori | 2006-08-15 |
| 7087530 | Aqueous dispersion for chemical mechanical polishing | Masayuki Motonari, Masayuki Hattori | 2006-08-08 |
| 7077879 | Composition for polishing pad and polishing pad using the same | Toshihiro Ogawa, Kou Hasegawa | 2006-07-18 |
| 7005382 | Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing | Kazuo Nishimoto, Tatsuaki Sakano, Akihiro Takemura, Masayuki Hattori, Naoto Miyashita +3 more | 2006-02-28 |
| 6992123 | Polishing pad | Hiroshi Shiho, Hiromi Aoi, Kou Hasegawa | 2006-01-31 |
| 6976910 | Polishing pad | Yukio Hosaka, Hiroshi Shiho, Kou Hasegawa | 2005-12-20 |
| 6935928 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | Kazuhito Uchikura, Kazuo Nishimoto, Masayuki Hattori, Hiroyuki Yano, Yukiteru Matsui +3 more | 2005-08-30 |
| 6924227 | Slurry for chemical mechanical polishing and method of manufacturing semiconductor device | Gaku Minamihaba, Hiroyuki Yano, Nobuyuki Kurashima, Masayuki Hattori, Kazuo Nishimoto | 2005-08-02 |
| 6832949 | Window member for chemical mechanical polishing and polishing pad | Tomohisa Konno, Masayuki Motonari, Masayuki Hattori, Kou Hasegawa | 2004-12-21 |
| 6790883 | Composition for polishing pad and polishing pad using the same | Toshihiro Ogawa, Kou Hasegawa | 2004-09-14 |
| 6786944 | Aqueous dispersion for chemical mechanical polishing | Masayuki Hattori, Michiaki Ando, Kazuo Nishimoto | 2004-09-07 |
| 6740629 | Composition for washing a polishing pad and method for washing a polishing pad | Michiaki Ando, Masayuki Hattori | 2004-05-25 |
| 6653267 | Aqueous dispersion for chemical mechanical polishing used for polishing of copper | Hiroyuki Yano, Gaku Minamihaba, Masayuki Motonari, Masayuki Hattori | 2003-11-25 |
| 6582761 | METHOD OF PRODUCTION OF COMPOSITED PARTICLE, COMPOSITED PARTICLE PRODUCED BY THIS METHOD AND AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING CONTAINING THIS COMPOSITED PARTICLE, AND METHOD OF PRODUCTION OF AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING | Kazuo Nishimoto, Masayuki Hattori | 2003-06-24 |
| 6579153 | Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing process | Kazuhito Uchikura, Masayuki Motonari, Masayuki Hattori | 2003-06-17 |