Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10090163 | Inorganic film-forming composition for multilayer resist processes, and pattern-forming method | Hisashi Nakagawa, Tatsuya Sakai, Shunsuke Kurita, Satoshi Dei, Kazunori Takanashi +1 more | 2018-10-02 |
| 9268229 | Composition for forming resist underlayer film, and pattern-forming method | Hiromitsu Tanaka, Junya Suzuki, Tooru Kimura | 2016-02-23 |
| 9182671 | Method for forming pattern, and composition for forming resist underlayer film | Shinya Nakafuji, Satoru Murakami, Yoshio Takimoto | 2015-11-10 |
| 9091922 | Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method | Shin-ya Nakafuji, Satoru Murakami, Kazuhiko Koumura, Yuushi MATSUMURA, Katsuhisa MIZOGUCHI | 2015-07-28 |
| 8927201 | Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition | Kazunori Takanashi, Yoshio Takimoto, Takashi Mori, Kazuo Nakahara | 2015-01-06 |
| 8741008 | Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method | Eiichirou Kunitani, Tomikazu Ueno, Takahiro Iijima, Takashi Matsuda | 2014-06-03 |
| 8574330 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor device | Yuuji Namie, Tomohisa Konno, Hirotaka Shida, Akihiro Takemura | 2013-11-05 |
| 8262435 | Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and chemical mechanical polishing aqueous dispersion preparation kit | Eiichirou Kunitani, Atsushi Baba, Shoei Tsuji | 2012-09-11 |
| 8128464 | Chemical mechanical polishing pad | Tomikazu Ueno, Masahiro Yamamoto, Yuugo Tai, Hiroyuki Miyauchi | 2012-03-06 |
| 7183211 | Process for chemical mechanical polishing of semiconductor substrate and aqueous dispersion for chemical mechanical polishing | Tomohisa Konno, Masayuki Hattori, Nobuo Kawahashi | 2007-02-27 |
| 7153369 | Method of chemical mechanical polishing | Masayuki Hattori, Nobuo Kawahashi | 2006-12-26 |
| 7087530 | Aqueous dispersion for chemical mechanical polishing | Masayuki Hattori, Nobuo Kawahashi | 2006-08-08 |
| 6832949 | Window member for chemical mechanical polishing and polishing pad | Tomohisa Konno, Masayuki Hattori, Kou Hasegawa, Nobuo Kawahashi | 2004-12-21 |
| 6653267 | Aqueous dispersion for chemical mechanical polishing used for polishing of copper | Hiroyuki Yano, Gaku Minamihaba, Masayuki Hattori, Nobuo Kawahashi | 2003-11-25 |
| 6579153 | Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing process | Kazuhito Uchikura, Masayuki Hattori, Nobuo Kawahashi | 2003-06-17 |
| 6565767 | Polymer particles and polishing material containing them | Masayuki Hattori, Akira Iio | 2003-05-20 |
| 6454819 | Composite particles and production process thereof, aqueous dispersion, aqueous dispersion composition for chemical mechanical polishing, and process for manufacture of semiconductor device | Hiroyuki Yano, Gaku Minamihaba, Yukiteru Matsui, Katsuya Okumura, Masayuki Hattori +1 more | 2002-09-24 |
| 6447695 | Aqueous dispersion composition for chemical mechanical polishing for use in manufacture of semiconductor devices | Masayuki Hattori, Nobuo Kawahashi | 2002-09-10 |
| 6375545 | Chemical mechanical method of polishing wafer surfaces | Hiroyuki Yano, Gaku Minamihaba, Yukiteru Matsui, Nobuo Hayasaka, Katsuya Okumura +2 more | 2002-04-23 |
| 6068769 | Aqueous dispersion slurry of inorganic particles and production methods thereof | Akira Iio, Masayuki Hattori | 2000-05-30 |
| 5691413 | Ethylene-.alpha.-olefin-non-conjugated diene copolymer rubber composition | Akihiko Morikawa, Masashi Shimakage, Katsumi Oka | 1997-11-25 |