Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10048586 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Sato, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi +3 more | 2018-08-14 |
| 9513548 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi +3 more | 2016-12-06 |
| 9323146 | Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base | Hayato Namai, Norihiko Ikeda | 2016-04-26 |
| 9304393 | Radiation-sensitive resin composition and compound | Ken MARUYAMA | 2016-04-05 |
| 8927201 | Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition | Kazunori Takanashi, Yoshio Takimoto, Takashi Mori, Masayuki Motonari | 2015-01-06 |
| 8895223 | Radiation-sensitive resin composition | Mitsuo Sato, Hiromitsu Nakashima | 2014-11-25 |
| 8728706 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi +3 more | 2014-05-20 |
| 8697335 | Radiation-sensitive resin composition and compound | Mitsuo Sato | 2014-04-15 |
| 8647810 | Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device | Tomoki Nagai | 2014-02-11 |
| 8609318 | Radiation-sensitive resin composition, method for forming resist pattern and polymer | Hiromitsu Nakashima, Reiko Kimura | 2013-12-17 |
| 8609321 | Radiation-sensitive resin composition, polymer and compound | Hiromitsu Nakashima, Reiko Kimura, Mitsuo Sato | 2013-12-17 |
| 8603726 | Radiation-sensitive resin composition, polymer and compound | Mitsuo Sato, Yusuke Asano | 2013-12-10 |
| 8273521 | Radiation-sensitive resin composition and compound | Mitsuo Sato, Hiromitsu Nakashima, Takanori Nakano, Makoto Sugiura | 2012-09-25 |