Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11966161 | Radiation-sensitive resin composition, method of forming resist pattern, and compound | Takuhiro Taniguchi, Katsuaki NISHIKORI, Kazuya KIRIYAMA, Ken MARUYAMA | 2024-04-23 |
| 11320739 | Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate | Goji Wakamatsu, Naoya Nosaka, Tsubasa Abe, Kazunori Sakai, Yuushi MATSUMURA | 2022-05-03 |
| 10824073 | Radiation-sensitive resin composition and resist pattern-forming method | Katsuaki NISHIKORI | 2020-11-03 |
| 10331031 | Resin composition, resist pattern-forming method and polymer | — | 2019-06-25 |
| 10088750 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | Norihiko Ikeda | 2018-10-02 |
| 9874816 | Radiation-sensitive resin composition and resist pattern-forming method | — | 2018-01-23 |
| 9760004 | Radiation-sensitive resin composition and resist pattern-forming method | Hiromu MIYATA, Masafumi Hori | 2017-09-12 |
| 9720322 | Photoresist composition, compound, and production method thereof | Norihiko Ikeda, Takanori Kawakami | 2017-08-01 |
| 9703195 | Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound | Kota Nishino | 2017-07-11 |
| 9594303 | Resist pattern-forming method and photoresist composition | Hitoshi Osaki, Shinya Minegishi | 2017-03-14 |
| 9588423 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | Norihiko Ikeda | 2017-03-07 |
| 9557641 | Photoresist composition, resist pattern-forming method, acid diffusion control agent, and compound | — | 2017-01-31 |
| 9529259 | Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound | — | 2016-12-27 |
| 9477149 | Photoresist composition, compound, and production method thereof | Norihiko Ikeda, Takanori Kawakami | 2016-10-25 |
| 9465291 | Radiation-sensitive resin composition, polymer, compound, and method for producing compound | — | 2016-10-11 |
| 9412593 | Composition for film formation, resist underlayer film, and forming method of resist underlayer film, and pattern-forming method | Goji Wakamatsu | 2016-08-09 |
| 9323146 | Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base | Kazuo Nakahara, Norihiko Ikeda | 2016-04-26 |
| 9233840 | Method for improving self-assembled polymer features | Joy Cheng, Daniel P. Sanders | 2016-01-12 |
| 9126231 | Insulation pattern-forming method and insulation pattern-forming material | Satoshi Dei, Kyoyu Yasuda, Koichi Hasegawa | 2015-09-08 |
| 8968586 | Pattern-forming method | — | 2015-03-03 |
| 8883023 | Method for forming pattern | Goji Wakamatsu, Syun Aoki | 2014-11-11 |
| 8734904 | Methods of forming topographical features using segregating polymer mixtures | Joy Cheng, Charles Thomas Rettner, Daniel P. Sanders, Ratnam Sooriyakumaran | 2014-05-27 |
| 8703395 | Pattern-forming method | Hiroki Nakagawa, Kentaro Harada, Takehiko Naruoka | 2014-04-22 |