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Ken MARUYAMA — 32 Patents

JSJsr: 30 patents #6 of 1,137Top 1%
Sumitomo Electric Industries: 1 patents #13,249 of 21,551Top 65%
Panasonic: 1 patents #13,316 of 21,108Top 65%
Tokyo, JP: #4,056 of 90,295 inventorsTop 5%
Overall (All Time): #110,428 of 4,157,543Top 3%
32 Patents All Time
Ken MARUYAMA has been granted 32 US patents while listed as an inventor at Jsr. The first was granted in 2005 and the most recent in September 2025. Ken MARUYAMA ranks #110,428 of 4,157,543 US inventors in our database (top 2.7%). Patent records list Ken MARUYAMA in Tokyo, JP.

Issued Patents All Time

Showing 1–25 of 32 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12422748 Radiation-sensitive resin composition and method for forming resist pattern — 2025-09-23
12092957 Radiation-sensitive resin composition, method for forming resist pattern and compound Kazuya KIRIYAMA, Katsuaki NISHIKORI, Takuhiro Taniguchi, Ryuichi NEMOTO 2024-09-17
11966161 Radiation-sensitive resin composition, method of forming resist pattern, and compound Takuhiro Taniguchi, Katsuaki NISHIKORI, Hayato Namai, Kazuya KIRIYAMA 2024-04-23
11747725 Radiation-sensitive resin composition and method for forming resist pattern — 2023-09-05
11745216 Method for producing film Ryo KUMEGAWA, Sosuke Osawa, Miki Tamada, Motohiro SHIRATANI 2023-09-05
11609495 Radiation-sensitive resin composition and resist pattern-forming method Katsuaki NISHIKORI, Kazuya KIRIYAMA, Takuhiro Taniguchi 2023-03-21
11592746 Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid Kazuya KIRIYAMA, Katsuaki NISHIKORI, Takuhiro Taniguchi 2023-02-28
11319388 Radiation-sensitive resin composition, production method thereof, and resist pattern-forming method Yoshiki Nonoyama, Takuo Sone, Motohiro SHIRATANI 2022-05-03
11204552 Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent Tomoki Nagai, Takehiko Naruoka, Motohiro SHIRATANI, Hisashi Nakagawa 2021-12-21
10216090 Pattern-forming method and composition for resist pattern-refinement Kanako MEYA, Yusuke Anno, Shuto MORI 2019-02-26
9304393 Radiation-sensitive resin composition and compound Kazuo Nakahara 2016-04-05
9261789 Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method Takahiro Hayama, Kazunori Kusabiraki, Yukio Nishimura, Kiyoshi Tanaka 2016-02-16
9200098 Radiation-sensitive composition and compound — 2015-12-01
9128370 Radiation-sensitive composition and compound — 2015-09-08
9120726 Radiation-sensitive resin composition, compound and producing method of compound — 2015-09-01
9122154 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent — 2015-09-01
9104102 Radiation-sensitive resin composition Yasuhiko Matsuda, Takanori Kawakami, Kazuki Kasahara 2015-08-11
9052600 Method for forming resist pattern and composition for forming protective film Koji Inukai 2015-06-09
9023584 Radiation-sensitive composition, and compound — 2015-05-05
8968980 Radiation-sensitive resin composition and compound Kota Nishino, Kazuki Kasahara, Hirokazu Sakakibara 2015-03-03
8889335 Radiation-sensitive resin composition — 2014-11-18
8889336 Radiation-sensitive resin composition and radiation-sensitive acid generating agent — 2014-11-18
8809476 Polymer Toshiyuki Kai 2014-08-19
8632945 Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition — 2014-01-21
8470513 Radiation-sensitive resin composition and polymer Kota Nishino, Daisuke Shimizu, Toshiyuki Kai 2013-06-25

Nearby-Ranked Inventors

Jean-Sebastien Merette32
Nicolas Francois32
Rainer Liebhart32
Robert E. Simonson32
Johannes Meyer32
Siddharth K. Saraya32
Anton S. Kaplanyan32
Timothy S. Sherwood32
John Klier32