| 8809476 |
Polymer |
Ken MARUYAMA |
2014-08-19 |
| 8771923 |
Radiation-sensitive composition |
Nobuji Matsumura, Daisuke Shimizu |
2014-07-08 |
| 8470513 |
Radiation-sensitive resin composition and polymer |
Kota Nishino, Ken MARUYAMA, Daisuke Shimizu |
2013-06-25 |
| 8450045 |
Pattern forming method |
Hikaru Sugita, Nobuji Matsumura, Daisuke Shimizu, Tsutomu Shimokawa |
2013-05-28 |
| 8377627 |
Compound and radiation-sensitive composition |
Daisuke Shimizu, Ken MARUYAMA, Tsutomu Shimokawa |
2013-02-19 |
| 8361691 |
Radiation-sensitive composition and process for producing low-molecular compound for use therein |
Nobuji Matsumura, Daisuke Shimizu |
2013-01-29 |
| 8334087 |
Polymer, radiation-sensitive composition, monomer, and method of producing compound |
Ken MARUYAMA |
2012-12-18 |
| 8173348 |
Method of forming pattern and composition for forming of organic thin-film for use therein |
Daisuke Shimizu, Hikaru Sugita, Nobuji Matsumura, Tsutomu Shimokawa |
2012-05-08 |
| 8173351 |
Compound and radiation-sensitive composition |
Daisuke Shimizu, Ken MARUYAMA, Tsutomu Shimokawa |
2012-05-08 |
| 8119324 |
Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film |
Hikaru Sugita, Nobuji Matsumura, Daisuke Shimizu, Tsutomu Shimokawa |
2012-02-21 |
| 7323284 |
Negative type radiation sensitive resin composition |
Daigo Ichinohe |
2008-01-29 |
| 6468714 |
Negative radiation-sensitive resin composition |
Yong Wang, Shirou Kusumoto, Yoshihisa Ohta |
2002-10-22 |
| 6403288 |
Resist pattern formation method |
Yukio Nishimura, Eiichi Kobayashi, Takeo Shioya |
2002-06-11 |
| 4338286 |
Process for recovering uranium and/or thorium from a liquid containing uranium and/or thorium |
Eiichiro Nakai, Hiroshi Kojima, Shoichi Tanaka, Shinichi Hasegawa |
1982-07-06 |