Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11384172 | Polymer, antimicrobial agent, disinfectant, antimicrobial material, disinfectant material, antimicrobial method, and disinfecting method | Hidenori Naruse, Atsushi Itou, Shigeru Ikawa, Masato Suzuki, Mari Matsui +3 more | 2022-07-12 |
| 10415011 | Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition | Katsuhiko Hieda, Hiroto Kubo, Takashi Doi | 2019-09-17 |
| 9348226 | Radiation-sensitive resin composition | Isao Nishimura, Kouichi Fujiwara, Eiichi Kobayashi, Atsushi Nakamura, Eiji Yoneda +1 more | 2016-05-24 |
| 8450045 | Pattern forming method | Hikaru Sugita, Nobuji Matsumura, Daisuke Shimizu, Toshiyuki Kai | 2013-05-28 |
| 8431324 | Radiation-sensitive resin composition | Takuma Ebata | 2013-04-30 |
| 8377627 | Compound and radiation-sensitive composition | Daisuke Shimizu, Ken MARUYAMA, Toshiyuki Kai | 2013-02-19 |
| 8211624 | Method for pattern formation and resin composition for use in the method | Atsushi Nakamura, Junichi Takahashi, Takayoshi Abe, Tomoki Nagai, Tomohiro Kakizawa | 2012-07-03 |
| 8173348 | Method of forming pattern and composition for forming of organic thin-film for use therein | Daisuke Shimizu, Hikaru Sugita, Nobuji Matsumura, Toshiyuki Kai | 2012-05-08 |
| 8173351 | Compound and radiation-sensitive composition | Daisuke Shimizu, Ken MARUYAMA, Toshiyuki Kai | 2012-05-08 |
| 8119324 | Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film | Hikaru Sugita, Nobuji Matsumura, Daisuke Shimizu, Toshiyuki Kai | 2012-02-21 |
| 7897821 | Sulfonium compound | Tomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura +1 more | 2011-03-01 |
| 7812105 | Compound, polymer, and radiation-sensitive composition | Tomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura +1 more | 2010-10-12 |
| 7297461 | Radiation sensitive resin composition | Isao Nishimura, Makoto Sugiura | 2007-11-20 |
| 7288359 | Radiation-sensitive resin composition | Haruo Iwasawa, Akihiro Hayashi | 2007-10-30 |
| 7244549 | Pattern forming method and bilayer film | Haruo Iwasawa, Akihiro Hayashi, Kazuo Kawaguchi, Masato Tanaka | 2007-07-17 |
| 7202016 | Radiation-sensitive resin composition | Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura +3 more | 2007-04-10 |
| 7108954 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Kenji Yamada | 2006-09-19 |
| 7108955 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | Haruo Iwasawa, Akihiro Hayashi, Masafumi Yamamoto | 2006-09-19 |
| 7105269 | Copolymer, polymer mixture, and radiation-sensitive resin composition | Tomoki Nagai, Daisuke Shimizu, Fumihisa Miyajima, Masaaki Miyaji | 2006-09-12 |
| 7037994 | Acenaphthylene derivative, polymer, and antireflection film-forming composition | Hikaru Sugita, Keiji Konno, Masato Tanaka | 2006-05-02 |
| 6964840 | Radiation-sensitive resin composition | Yukio Nishimura, Noboru Yamahara, Masafumi Yamamoto, Toru Kajita, Hiroshi Ito | 2005-11-15 |
| 6933094 | Radiation-sensitive resin composition | Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura +3 more | 2005-08-23 |
| 6852791 | Anti-reflection coating forming composition | Kazuo Kawaguchi, Masato Tanaka | 2005-02-08 |
| 6846895 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition | Haruo Iwasawa, Akihiro Hayashi, Satoru Nishiyama | 2005-01-25 |
| 6830868 | Anthracene derivative and radiation-sensitive resin composition | Tomoki Nagai | 2004-12-14 |