Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10370631 | Cell culture package and package containing cell-culture material | — | 2019-08-06 |
| 10232363 | Safety cabinet | Hiroshi Goto, Yosuke Otsuka, Shinya Hirasawa, Ken-ichiro Hata, Yukio Mori | 2019-03-19 |
| 10072861 | Clean work device | Ken-ichiro Hata | 2018-09-11 |
| 9624462 | Cell separation container | — | 2017-04-18 |
| 9236188 | Multilayer ceramic capacitor | Mayumi Yamada, Atsushi Ishida | 2016-01-12 |
| 9029069 | Resist underlayer film-forming composition and method for forming pattern | Shin-ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano +2 more | 2015-05-12 |
| 9029067 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | Gouji Wakamatsu, Masafumi Hori, Kouichi Fujiwara | 2015-05-12 |
| 8877429 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | Gouji Wakamatsu, Masafumi Hori, Kouichi Fujiwara | 2014-11-04 |
| 8859185 | Resist underlayer film-forming composition | Shin-ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano +2 more | 2014-10-14 |
| 8808974 | Method for forming pattern | Yukio Nishimura, Kaori Sakai, Nobuji Matsumura, Atsushi Nakamura, Gouji Wakamatsu +1 more | 2014-08-19 |
| 8802348 | Radiation-sensitive resin composition | Noboru Otsuka, Takanori Kawakami, Yukio Nishimura | 2014-08-12 |
| 8697344 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Norihiko Sugie, Gouji Wakamatsu, Norihiro Natsume, Yukio Nishimura | 2014-04-15 |
| 8513133 | Composition for forming resist underlayer film and method for forming pattern | Shin-ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano +2 more | 2013-08-20 |
| 8501385 | Positive-type radiation-sensitive composition, and resist pattern formation method | Yusuke Anno, Kouichi Fujiwara, Gouji Wakamatsu | 2013-08-06 |
| 8431332 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Norihiko Sugie, Gouji Wakamatsu, Norihiro Natsume, Yukio Nishimura | 2013-04-30 |
| 8273521 | Radiation-sensitive resin composition and compound | Mitsuo Sato, Kazuo Nakahara, Hiromitsu Nakashima, Takanori Nakano | 2012-09-25 |
| 7897821 | Sulfonium compound | Tomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Tsutomu Shimokawa +1 more | 2011-03-01 |
| 7812105 | Compound, polymer, and radiation-sensitive composition | Tomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Tsutomu Shimokawa +1 more | 2010-10-12 |
| 7297461 | Radiation sensitive resin composition | Isao Nishimura, Tsutomu Shimokawa | 2007-11-20 |
| 6645881 | Method of forming coating film, method of manufacturing semiconductor device and coating solution | Nobuhide Yamada, Rempei Nakata, Mutsuhiko Yoshioka, Takahiro Kitano, Shinji Kobayashi | 2003-11-11 |
| 6406794 | Film-forming composition | Atsushi Shiota, Takahiko Kurosawa, Eiji Hayashi, Toshiyuki Akiike, Keiji Konno +3 more | 2002-06-18 |
| 5977035 | Liquid agent for contact lens containing carboxylated amine as a preservative or sterilizing component | Keiko Ibaraki | 1999-11-02 |
| 5928606 | Device and method for cleaning and disinfecting contact lens using water-absorbing solid soft material carrying disinfectant | — | 1999-07-27 |
| 5375494 | Image Forming apparatus and roll paper cutting machine | Hiroshi Kajita, Akihiro Kondoh, Nobuhiro Nishioka, Masahiko Fukano, Eiji Gotoh +2 more | 1994-12-27 |
| 5248553 | Coated molded article | Susumu Miyashita | 1993-09-28 |