Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11681222 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2023-06-20 |
| 11036133 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2021-06-15 |
| 11003079 | Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound | Naoya Nosaka, Tsubasa Abe, Yuushi MATSUMURA, Masayuki Miyake, Yoshio Takimoto | 2021-05-11 |
| 10620534 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2020-04-14 |
| 10146131 | Composition, method for producing patterned substrate, film and forming method thereof, and compound | Shin-ya Nakafuji, Fumihiro Toyokawa, Yoshio Takimoto, Katsuhisa MIZOGUCHI, Takashi Okada +3 more | 2018-12-04 |
| 10082733 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2018-09-25 |
| 9696626 | Composition for forming a resist underlayer film, and pattern-forming method | Fumihiro Toyokawa, Shin-ya Nakafuji | 2017-07-04 |
| 9500950 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2016-11-22 |
| 9400429 | Composition for forming a resist underlayer film, and pattern-forming method | Fumihiro Toyokawa, Shin-ya Nakafuji | 2016-07-26 |
| 9213236 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2015-12-15 |
| 9029067 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | Masafumi Hori, Kouichi Fujiwara, Makoto Sugiura | 2015-05-12 |
| 8877429 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | Masafumi Hori, Kouichi Fujiwara, Makoto Sugiura | 2014-11-04 |
| 8808974 | Method for forming pattern | Yukio Nishimura, Kaori Sakai, Nobuji Matsumura, Makoto Sugiura, Atsushi Nakamura +1 more | 2014-08-19 |
| 8697344 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Norihiko Sugie, Norihiro Natsume, Yukio Nishimura, Makoto Sugiura | 2014-04-15 |
| 8697343 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Kentarou Harada, Yukio Nishimura, Takeo Shioya | 2014-04-15 |
| 8501385 | Positive-type radiation-sensitive composition, and resist pattern formation method | Yusuke Anno, Kouichi Fujiwara, Makoto Sugiura | 2013-08-06 |
| 8431332 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Norihiko Sugie, Norihiro Natsume, Yukio Nishimura, Makoto Sugiura | 2013-04-30 |
| 8206894 | Resist pattern-forming method and resist pattern miniaturizing resin composition | Takayoshi Abe, Atsushi Nakamura | 2012-06-26 |