Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8895229 | Composition for formation of upper layer film, and method for formation of photoresist pattern | Yukio Nishimura, Norihiko Sugie, Hiromitsu Nakashima, Daita Kouno | 2014-11-25 |
| 8697344 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Norihiko Sugie, Gouji Wakamatsu, Yukio Nishimura, Makoto Sugiura | 2014-04-15 |
| 8497062 | Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method | Norihiko Sugie, Junichi Takahashi | 2013-07-30 |
| 8431332 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Norihiko Sugie, Gouji Wakamatsu, Yukio Nishimura, Makoto Sugiura | 2013-04-30 |
| 7514205 | Composition for forming antireflection film, laminate, and method for forming resist pattern | Nakaatsu Yoshimura, Keiji Konno | 2009-04-07 |
| 6623907 | Radiation-sensitive resin composition | Jun Numata, Aki Suzuki, Hiromichi Hara, Kiyoshi Murata, Masafumi Yamamoto +3 more | 2003-09-23 |