Issued Patents All Time
Showing 25 most recent of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11681222 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2023-06-20 |
| 11603459 | Resin composition and method of forming resist pattern | Tomohiko SAKURAI, Sosuke Osawa | 2023-03-14 |
| 11130856 | Resin composition and method of forming resist pattern | Tomohiko SAKURAI, Sosuke Osawa | 2021-09-28 |
| 11036133 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2021-06-15 |
| 10620534 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2020-04-14 |
| 10564546 | Resist pattern-forming method | Tomohiko SAKURAI, Sousuke Oosawa, Kousuke Terayama | 2020-02-18 |
| 10082733 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2018-09-25 |
| 10048586 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Sato, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori +3 more | 2018-08-14 |
| 9598520 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | Yuko Kiridoshi, Takehiko Naruoka, Yukio Nishimura, Yusuke Asano, Takanori Kawakami | 2017-03-21 |
| 9513548 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Satou, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori +3 more | 2016-12-06 |
| 9500950 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2016-11-22 |
| 9268219 | Photoresist composition and resist pattern-forming method | Hiromu MIYATA, Masafumi Yoshida | 2016-02-23 |
| 9213236 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2015-12-15 |
| 9158196 | Radiation-sensitive resin composition and pattern-forming method | Kazuki Kasahara, Masafumi Hori, Masafumi Yoshida | 2015-10-13 |
| 9116427 | Composition for forming resist underlayer film and pattern-forming method | Shunsuke Kurita, Kazunori Takanashi, Tooru Kimura | 2015-08-25 |
| 9046765 | Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film | Toru Kimura, Yusuke Asano, Masafumi Hori, Reiko Kimura, Kazuki Kasahara +2 more | 2015-06-02 |
| 8895223 | Radiation-sensitive resin composition | Mitsuo Sato, Kazuo Nakahara | 2014-11-25 |
| 8895229 | Composition for formation of upper layer film, and method for formation of photoresist pattern | Yukio Nishimura, Norihiko Sugie, Norihiro Natsume, Daita Kouno | 2014-11-25 |
| 8728706 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Satou, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori +3 more | 2014-05-20 |
| 8697343 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Harada, Yukio Nishimura, Takeo Shioya | 2014-04-15 |
| 8609318 | Radiation-sensitive resin composition, method for forming resist pattern and polymer | Kazuo Nakahara, Reiko Kimura | 2013-12-17 |
| 8609321 | Radiation-sensitive resin composition, polymer and compound | Reiko Kimura, Kazuo Nakahara, Mitsuo Sato | 2013-12-17 |
| 8609319 | Radiation-sensitive resin composition and resist film formed using the same | Toru Kimura, Reiko Kimura, Kazuki Kasahara, Masafumi Hori, Masafumi Yoshida | 2013-12-17 |
| 8597867 | Lactone copolymer and radiation-sensitive resin composition | Tomohiro Utaka, Takashi Chiba, Eiji Yoneda, Atsushi Nakamura | 2013-12-03 |
| 8507189 | Upper layer film forming composition and method of forming photoresist pattern | Daita Kouno, Yukio Nishimura | 2013-08-13 |