| 11681222 |
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition |
Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura |
2023-06-20 |
| 11036133 |
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition |
Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura |
2021-06-15 |
| 10620534 |
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition |
Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura |
2020-04-14 |
| 10082733 |
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition |
Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura |
2018-09-25 |
| 9500950 |
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition |
Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura |
2016-11-22 |
| 9354523 |
Composition for resist pattern-refinement, and fine pattern-forming method |
Yuuko Kiridoshi, Hiroyuki Nii, Tsuyoshi Furukawa |
2016-05-31 |
| 9213236 |
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition |
Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura |
2015-12-15 |
| 8927200 |
Double patterning method |
Kanako MEYA, Motoyuki Shima |
2015-01-06 |
| 8697343 |
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition |
Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Harada, Yukio Nishimura |
2014-04-15 |
| 6403288 |
Resist pattern formation method |
Yukio Nishimura, Toshiyuki Kai, Eiichi Kobayashi |
2002-06-11 |
| 6337171 |
Radiation-sensitive resin composition |
Eiichi Kobayashi, Yukio Nishimura |
2002-01-08 |