Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D1063125 | Wall panel | — | 2025-02-18 |
| 11705331 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Takehiko Naruoka | 2023-07-18 |
| 11460767 | Composition for film formation, film-forming method and directed self-assembly lithography process | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Takehiko Naruoka | 2022-10-04 |
| 11370872 | Composition for pattern formation, and pattern-forming method | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Takehiko Naruoka | 2022-06-28 |
| 11335559 | Pattern-forming method, and composition | Hiroyuki Komatsu, Tomohiro Oda, Takehiko Naruoka, Tomoki Nagai | 2022-05-17 |
| 11211246 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Takehiko Naruoka | 2021-12-28 |
| 10950438 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Takehiko Naruoka | 2021-03-16 |
| 10691019 | Pattern-forming method and composition | Hiroyuki Komatsu, Takehiko Naruoka, Hitoshi Osaki, Tomohiro Oda | 2020-06-23 |
| 10048586 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Sato, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi +3 more | 2018-08-14 |
| 9760004 | Radiation-sensitive resin composition and resist pattern-forming method | Hiromu MIYATA, Hayato Namai | 2017-09-12 |
| 9513548 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi +3 more | 2016-12-06 |
| 9335630 | Pattern-forming method, and radiation-sensitive composition | Hirokazu Sakakibara, Taiichi Furukawa, Koji Ito | 2016-05-10 |
| 9223207 | Resist pattern-forming method, and radiation-sensitive resin composition | Hirokazu Sakakibara, Taiichi Furukawa, Koji Ito, Hiromu MIYATA | 2015-12-29 |
| 9170488 | Resist pattern-forming method, and radiation-sensitive resin composition | Hirokazu Sakakibara, Taiichi Furukawa, Reiko Kimura | 2015-10-27 |
| 9164387 | Pattern-forming method, and radiation-sensitive resin composition | Hirokazu Sakakibara, Koji Ito, Reiko Kimura, Taiichi Furukawa | 2015-10-20 |
| 9158196 | Radiation-sensitive resin composition and pattern-forming method | Kazuki Kasahara, Hiromitsu Nakashima, Masafumi Yoshida | 2015-10-13 |
| 9046765 | Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film | Hiromitsu Nakashima, Toru Kimura, Yusuke Asano, Reiko Kimura, Kazuki Kasahara +2 more | 2015-06-02 |
| 9034559 | Pattern-forming method, and radiation-sensitive composition | Hirokazu Sakakibara, Taiichi Furukawa, Koji Ito | 2015-05-19 |
| 9029067 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | Gouji Wakamatsu, Kouichi Fujiwara, Makoto Sugiura | 2015-05-12 |
| 8877429 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | Gouji Wakamatsu, Kouichi Fujiwara, Makoto Sugiura | 2014-11-04 |
| 8815493 | Resist pattern-forming method, and radiation-sensitive resin composition | Koji Ito, Hirokazu Sakakibara, Taiichi Furukawa | 2014-08-26 |
| 8795954 | Resist pattern-forming method, and radiation-sensitive resin composition | Hirokazu Sakakibara, Taiichi Furukawa, Reiko Kimura | 2014-08-05 |
| 8728706 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi +3 more | 2014-05-20 |
| 8609319 | Radiation-sensitive resin composition and resist film formed using the same | Toru Kimura, Hiromitsu Nakashima, Reiko Kimura, Kazuki Kasahara, Masafumi Yoshida | 2013-12-17 |