Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11705331 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Masafumi Hori, Takehiko Naruoka | 2023-07-18 |
| 11525067 | Modification method of substrate surface, and composition and polymer | Hiroyuki Komatsu, Miki Tamada, Tomoki Nagai | 2022-12-13 |
| 11460767 | Composition for film formation, film-forming method and directed self-assembly lithography process | Hiroyuki Komatsu, Tomohiro Oda, Masafumi Hori, Takehiko Naruoka | 2022-10-04 |
| 11462405 | Pattern-forming method and patterned substrate | Hiroyuki Komatsu, Miki Tamada, Tomoki Nagai | 2022-10-04 |
| 11426761 | Modification method of surface of base, composition, and polymer | Hiroyuki Komatsu, Miki Tamada, Tomoki Nagai | 2022-08-30 |
| 11370872 | Composition for pattern formation, and pattern-forming method | Masafumi Hori, Hiroyuki Komatsu, Tomohiro Oda, Takehiko Naruoka | 2022-06-28 |
| 11211246 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Masafumi Hori, Takehiko Naruoka | 2021-12-28 |
| 11195714 | Pattern-forming method | Jeffrey Kmiec | 2021-12-07 |
| 10950438 | Method and composition for selectively modifying base material surface | Hiroyuki Komatsu, Tomohiro Oda, Masafumi Hori, Takehiko Naruoka | 2021-03-16 |
| 10923342 | Selective modification method of a base material surface | Hiroyuki Komatsu | 2021-02-16 |
| 10691019 | Pattern-forming method and composition | Hiroyuki Komatsu, Takehiko Naruoka, Masafumi Hori, Tomohiro Oda | 2020-06-23 |
| 10394121 | Pattern-forming method and composition | — | 2019-08-27 |
| 10175575 | Pattern-forming method and composition | — | 2019-01-08 |
| 9847232 | Pattern-forming method | Kristin Schmidt, Chi-Chun Liu | 2017-12-19 |
| 9594303 | Resist pattern-forming method and photoresist composition | Hayato Namai, Shinya Minegishi | 2017-03-14 |
| 9040221 | Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound | Yusuke Asano, Mitsuo Sato, Tomoki Nagai | 2015-05-26 |