Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8921027 | Radiation-sensitive resin composition | Ryuichi SERIZAWA, Hirokazu Sakakibara | 2014-12-30 |
| 8808974 | Method for forming pattern | Yukio Nishimura, Kaori Sakai, Makoto Sugiura, Atsushi Nakamura, Gouji Wakamatsu +1 more | 2014-08-19 |
| 8771923 | Radiation-sensitive composition | Daisuke Shimizu, Toshiyuki Kai | 2014-07-08 |
| 8697331 | Compound, polymer, and radiation-sensitive composition | Hirokazu Sakakibara, Takehiko Naruoka, Makoto Shimizu, Yukio Nishimura, Yuusuke Asano | 2014-04-15 |
| 8530692 | Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound | Yuusuke Asano, Hirokazu Sakakibara, Yukio Nishimura, Takehiko Naruoka | 2013-09-10 |
| 8507575 | Radiation-sensitive resin composition, polymer, and compound | Yukio Nishimura, Akimasa Soyano, Ryuichi SERIZAWA, Noboru Otsuka, Hiroshi Tomioka | 2013-08-13 |
| 8450045 | Pattern forming method | Hikaru Sugita, Daisuke Shimizu, Toshiyuki Kai, Tsutomu Shimokawa | 2013-05-28 |
| 8361691 | Radiation-sensitive composition and process for producing low-molecular compound for use therein | Daisuke Shimizu, Toshiyuki Kai | 2013-01-29 |
| 8273837 | Compound, polymer, and resin composition | Tomoki Nagai, Takuma Ebata | 2012-09-25 |
| 8173348 | Method of forming pattern and composition for forming of organic thin-film for use therein | Daisuke Shimizu, Hikaru Sugita, Toshiyuki Kai, Tsutomu Shimokawa | 2012-05-08 |
| 8119324 | Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film | Hikaru Sugita, Daisuke Shimizu, Toshiyuki Kai, Tsutomu Shimokawa | 2012-02-21 |