AS

Atsushi Shiota

JS Jsr: 24 patents #16 of 1,137Top 2%
CF Cornell Research Foundation: 2 patents #418 of 1,638Top 30%
KT Kabushiki Kaisha Toshiba: 2 patents #9,982 of 21,451Top 50%
JR Japan Synthetic Rubber: 1 patents #256 of 558Top 50%
AT Axcelis Technologies: 1 patents #165 of 300Top 60%
SC Sumitomo Bakelite Co.: 1 patents #403 of 790Top 55%
TO Toyota: 1 patents #15,335 of 26,838Top 60%
📍 Toyota, NY: #4 of 7 inventorsTop 60%
Overall (All Time): #135,043 of 4,157,543Top 4%
28
Patents All Time

Issued Patents All Time

Showing 1–25 of 28 patents

Patent #TitleCo-InventorsDate
12319228 Automobile antitheft device Yuuji Utou 2025-06-03
8404786 Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same Masahiro Akiyama, Takahiko Kurosawa, Hisashi Nakagawa 2013-03-26
8268403 Method for forming organic silica film, organic silica film, wiring structure, semiconductor device, and composition for film formation Masahiro Akiyama, Hisashi Nakagawa, Tatsuya Yamanaka, Takahiko Kurosawa 2012-09-18
7932295 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device Hajime Tsuchiya, Hiromi Egawa, Terukazu Kokubo 2011-04-26
7875317 Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same Hisashi Nakagawa, Masahiro Akiyama, Takahiko Kurosawa 2011-01-25
7736748 Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same Masahiro Akiyama, Hisashi Nakagawa, Takahiko Kurosawa 2010-06-15
7608928 Laminated body and semiconductor device Kaori Shirato, Masahiro Tada, Sumitoshi Asakuma 2009-10-27
7528207 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film Hisashi Nakagawa, Masahiro Akiyama, Takahiko Kurosawa 2009-05-05
7514151 Insulating film and method for forming the same, and film-forming composition 2009-04-07
7399715 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device Hajime Tsuchiya, Hiromi Egawa, Terukazu Kokubo 2008-07-15
7358317 Polycarbosilane and method of producing the same Hisashi Nakagawa, Masahiro Akiyama, Takahiko Kurosawa 2008-04-15
7297360 Insulation film Mutsuhiko Yoshioka, Eiji Hayashi, Kouji Sumiya 2007-11-20
7291567 Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device Hajime Tsuchiya, Seitaro Hattori, Masahiro Akiyama 2007-11-06
7026053 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device Kouji Sumiya 2006-04-11
7011868 Fluorine-free plasma curing process for porous low-k materials Carlo Waldfried, Qingyuan Han, Orlando Escorcia, Ralph Albano, Ivan L. Berry, III 2006-03-14
6902771 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device Kouji Sumiya 2005-06-07
6890605 Method of film formation, insulating film, and substrate for semiconductor Michinori Nishikawa, Manabu Sekiguchi, Matthias Patz, Mutsuhiko Yoshioka, Kinji Yamada 2005-05-10
6824833 Stacked film, insulating film and substrate for semiconductor Michinori Nishikawa, Manabu Sekiguchi, Matthias Patz, Kinji Yamada 2004-11-30
6800330 Composition for film formation, method of film formation, and silica-based film Eiji Hayashi, Michinori Nishikawa, Kinji Yamada 2004-10-05
6787193 Method for the formation of silica film, silica film, insulating film, and semiconductor device Eiji Hayashi, Michinori Nishikawa, Kinji Yamada 2004-09-07
6749944 Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor Michinori Nishikawa, Manabu Sekiguchi, Kinji Yamada 2004-06-15
6558747 Method of forming insulating film and process for producing semiconductor device Rempei Nakata, Nobuhide Yamada, Hideshi Miyajima, Akihiro Kojima, Takahiko Kurosawa +3 more 2003-05-06
6410150 Composition for film formation, method of film formation, and insulating film Takahiko Kurosawa, Eiji Hayashi, Seo Youngsoon, Keiji Konno, Kinji Yamada 2002-06-25
6410151 Composition for film formation, method of film formation, and insulating film Takahiko Kurosawa, Eiji Hayashi, Seo Youngsoon, Kinji Yamada 2002-06-25
6406794 Film-forming composition Takahiko Kurosawa, Eiji Hayashi, Makoto Sugiura, Toshiyuki Akiike, Keiji Konno +3 more 2002-06-18