| 7629272 |
Ultraviolet assisted porogen removal and/or curing processes for forming porous low k dielectrics |
Carlo Waldfried, Orlando Escorcia, Ivan L. Berry, III |
2009-12-08 |
| 7078161 |
Plasma ashing process for removing photoresist and residues during ferroelectric device fabrication |
Carlo Waldfried, Orlando Escorcia, Ebrahim Andideh |
2006-07-18 |
| 7011868 |
Fluorine-free plasma curing process for porous low-k materials |
Carlo Waldfried, Orlando Escorcia, Ralph Albano, Ivan L. Berry, III, Atsushi Shiota |
2006-03-14 |
| 6951823 |
Plasma ashing process |
Carlo Waldfried, Orlando Escorcia, Thomas Buckley, Palani Sakthivel |
2005-10-04 |
| 6913796 |
Plasma curing process for porous low-k materials |
Ralph Albano, Cory Bargeron, Ivan L. Berry, III, Jeff Bremmer, Phil Dembowski +3 more |
2005-07-05 |
| 6759133 |
High modulus, low dielectric constant coatings |
Ivan L. Berry, III, Kyuha Chung, Youfan Liu, Eric Scott Moyer, Michael John Spaulding |
2004-07-06 |
| 6759098 |
Plasma curing of MSQ-based porous low-k film materials |
Carlo Waldfried, Orlando Escorcia, Ralph Albano, Ivan L. Berry, III, Jeff Jang +1 more |
2004-07-06 |
| 6756085 |
Ultraviolet curing processes for advanced low-k materials |
Carlo Waldfried, Orlando Escorcia, Ivan L. Berry, III |
2004-06-29 |
| 6630406 |
Plasma ashing process |
Carlo Waldfried, Ivan L. Berry, III, Orlando Escorcia, Palani Sakthivel |
2003-10-07 |
| 6576300 |
High modulus, low dielectric constant coatings |
Ivan L. Berry, III, Kyuha Chung, Youfan Liu, Eric Scott Moyer, Michael John Spaulding |
2003-06-10 |
| 6558755 |
Plasma curing process for porous silica thin film |
Ivan L. Berry, III, Todd Bridgewater, Wei Chen, Eric Scott Moyer, Michael John Spaulding +1 more |
2003-05-06 |
| 6548416 |
Plasma ashing process |
Ivan L. Berry, III, Palani Sakthivel, Carlo Waldfried |
2003-04-15 |
| 6406836 |
Method of stripping photoresist using re-coating material |
Robert Douglas Mohondro, Ivan L. Berry, III, Mahmoud Dahimene, Stuart Rounds |
2002-06-18 |
| 6281135 |
Oxygen free plasma stripping process |
Ivan L. Berry, III, Palani Sakthivel, Ricky Ruffin, Mammoud Dahimene |
2001-08-28 |